Catalog excerpts
>'w % Impedans /,. I PLASMA MEASUREMENT Instrument Catalogue
Open the catalog to page 1Table of Contents Substrate Ion Interactions 6 Semion System | Ion Energy Distribution Measurement System 8 Vertex System | Ion Angular and Energy Distribution Measurement System 10 Quantum System | Neutral Fraction and Ion Energy Measurement System 12 Species System | Ion Mass and Energy Measurement System 14 Bulk Plasma Parameters 16 Langmuir Probe | Plasma Parameter Characterisation System 18 Plato Probe | Process Compatible Plasma Measurement System 20 Bdot Probe | RF Plasma Magnetic Field Measurement System 22 Atmospheric Plasma Parameters 24 Atmospherix...
Open the catalog to page 2Plasma Measurement to Understand and Control the Future Impedans focus exclusively on innovative plasma measurement systems incorporating unique expertise built up over many years of experience. We believe the right plasma measurement products and ongoing expertise will enable our customers to better understand and control their processes. The knowledge and understanding gained by our customers help them create value and stay ahead of the competition.
Open the catalog to page 3Substrate Ion Interactions Interactions of ions at a substrate play a major role in plasma processing. The ability to quantify the flux and energy of ions impacting a surface is crucial for optimising process conditions. System Comparison Chart
Open the catalog to page 4Measuring Parameters Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe Enclosure and Holder Material RFEA Probe Cable Length “The Semion retarding field energy analyser allows users to change their plasma input parameters such as power, pressure, frequencies and chemistries in real time to find their optimum ion energy and ion flux for their application.” 1 -...
Open the catalog to page 5Learn more about this system Vertex System Ion Angular Distribution Measuring Parameters Ion Angle Resolution Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe Enclosure and Holder Material RFEA Probe Cable Length “By measuring the uniformity of ion angular distribution from different locations the user can identify changes in their process and troubleshoot...
Open the catalog to page 6Learn more about this system Ion Energy Range Ion Current IEDF Resolution Crystal Measurement Channels Deposition as a Function of Time showing Flux Fraction Quantum System Measuring Parameters Crystal Monitor Frequency Range Mass Resolution (at sensor surface) Film Thickness Resolution (Copper) Measurement Update Rate Mass Resolution (at crystal) Frequency Resolution Total deposition rate versus neutral deposition rate in a plasma deposition chamber Deposition as a Function of Average Ion Energy Holder Diameter Holder Thickness RF Bias Frequency Range RFEA probe holder mounted on electrode...
Open the catalog to page 7Measuring Parameters Ion Mass and Energy Ion Mass Resolution Ion Mass Range Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Ion mass spectrum in an Argon Oxygen plasma RFEA Probe Energy Spectrum “Ion mass and energy can now be measured on a biased substrate using a miniaturized 5mm thick sensor." Number of Sensors Probe Configuration Button Probe Diameter Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe...
Open the catalog to page 8Bulk Plasma Parameters The parameters that make up the bulk of the plasma such as plasma potential, plasma density, ion density, electron energy and electron temperature can be measured giving greater understanding of the bulk plasma.
Open the catalog to page 9Learn more about this system Measuring Parameters Plasma Potential Plasma Density Electron Temperature Spatial Resolution Electron Energy Distribution Function Bulk Plasma Parameters Floating Potential Langmuir Probe Langmuir Probe Specifications Plasma Power Source Probe Length Probe Diameter Probe Customisation 90°, 45° bend (custom available) Maximum Operating Temperature “The Langmuir Probe is by far the best commercial Langmuir Probe on the market, with its ultra fast repeatable measurements. Now the system includes a Single and Double Langmuir Probe as standard.” DC, RF, microwave,...
Open the catalog to page 10Learn more about this system Process Compatible Plasma Measurement System Measuring Parameters Plato Probe Measurements Plasma Density Electron Temperature Plato Probe Curve with precursor added Curve without precursor Plato Probe Specifications Plasma Power Source RF Plasma Probe Length Probe Diameter Probe Customisation Maximum Operating Temperature DC, RF, microwave, continuous, pulsed plasma Current and voltage characteristic with and without depositing precursor Time Resolved Ion Density 9 1015 Linear Drive Step Resolution Control Mechanism Automated through software Drive Length...
Open the catalog to page 11Learn more about this system z Magnetic Flux Strength Bdot Probe Specifications RF, continuous, pulsed plasma Probe Length Probe Diameter Single Probe Loop Radius Double Probe Loop Radius Probe Customisation 90°, 45° bend (custom available) Maximum Operating Temperature Linear Drive Step Resolution Control Mechanism • Time averaged • Time resolved • Time trend Bdot linear drive Bdot replaceable tips Bdot replaceable shaft Time-resolved measurements Time averaged measurements External trigger The Bdot Spatial Probe is used in most sectors using RF plasma across industry and research, such as...
Open the catalog to page 12Atmospheric Plasma Parameters Plasmas used in applications at high pressures have become more prevalent in recent years. The ability to measure and understand the plasma parameters gives great insight into the processes.
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