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Impedans Instrument Catalogue

Impedans Instrument Catalogue
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Impedans Instrument Catalogue

Product catalog summary
Instrument Catalogue Summary
1. Substrate Ion Interactions
The document emphasizes the significance of understanding ion interactions at substrates for optimizing plasma processing conditions. It highlights the necessity of quantifying ion flux and energy impacting surfaces.
2. Semion System
This system measures ion energy distribution and flux using a multi-sensor retarding field energy analyzer. It is utilized for researching wafer uniformity in plasma applications, featuring time-averaged and time-resolved measurements, along with a user-friendly software interface.
3. Vertex System
The Vertex System measures ion angular distribution and energy from multiple locations within a plasma reactor. It is applied in plasma etching and sputtering, where ion angle influences the etch profile and sputter rate.
4. Quantum System
This system measures ion neutral fraction and deposition rate using a gridded quartz crystal microbalance. It is applicable in plasma deposition and coatings, providing insights into plasma processes and tool development.
5. Species System
The Species System analyzes ion mass and energy, offering the capability to differentiate energy distribution of different ion species. It aids in chamber matching, fault detection, and process research.
6. Bulk Plasma Parameters
Parameters such as plasma potential, density, and electron energy distribution are measured to understand bulk plasma characteristics.
7. Langmuir Probe
This probe characterizes bulk plasma parameters, measuring floating potential, plasma density, and electron energy distribution.
8. Additional Systems
The document also mentions other systems like the Plato Probe, Bdot Probe, and Atmospherix Probe, each designed for specific plasma measurement tasks.
Conclusion
The catalogue underscores the importance of precise plasma measurement systems for process optimization and innovation in plasma applications.
Langmuir Probe Overview
The Langmuir Probe is a sophisticated plasma diagnostic tool used to measure various plasma parameters such as floating potential, plasma potential, plasma density, ion current density, electron energy distribution function, and electron temperature. It features automated electronics, advanced analytical software, and replaceable probe heads. The probe is known for its speed and reliability, offering time resolution of 12.5ns and real-time data analysis. It supports a wide range of plasma applications and is essential for understanding plasma processes and reducing development time.

Specifications
  • Plasma Power Source: DC, RF, microwave, continuous, pulsed plasma
  • Probe Length: 300mm to 1400mm
  • Probe Diameter: 6.5mm
  • Maximum Operating Temperature: 230°C
  • Communication: USB 2.0
  • Sampling Rate: 80 MSPS

Plato Probe Overview
The Plato Probe is designed for deposition plasmas, particularly when an insulating film is deposited on the probe surface. It measures plasma density, ion current density, and electron temperature in high deposition rate environments. The probe uses ultra-fast biasing technology to penetrate deposited films and is crucial for understanding plasma changes in reactive gas environments.

Specifications
  • Plasma Power Source: DC, RF, microwave, continuous, pulsed plasma
  • Probe Length: 300mm to 1400mm
  • Maximum Operating Temperature: 230°C
  • Communication: USB 2.0
  • Sampling Rate: 80 MSPS

Bdot Probe Overview
The Bdot Spatial Probe measures the rate of change in magnetic fields across a plasma reactor. It is used in various sectors for plasma diagnostics, tool design, and research. The probe provides insights into time-varying magnetic fields, aiding in the understanding of plasma uniformity and other common issues.

Specifications
  • Plasma Power Source: RF, continuous, pulsed plasma
  • Probe Length: 300mm to 1400mm
  • Maximum Operating Temperature: 230°C
  • Communication: USB 2.0
  • Sampling Rate: 10 samples per second

Atmospherix Probe Overview
The Atmospherix Probe is designed for high-pressure plasma environments, including atmospheric pressure plasma. It measures electron temperature, plasma density, ion flux, ion density, and Debye length. The probe is equipped with automated electronics and software, and features a linear drive system for controlled movement through plasma.

Specifications
  • Plasma Power Source: DC, RF, arc, torch, microwave, continuous and pulsed
  • Probe Length: 300mm
  • Maximum Gas Temperature: 5,000°C
  • Communication: USB 2.0
  • Sampling Rate: 80 MSPS

Octiv System Overview
The Octiv Poly is a multi-frequency in-line RF measurement system that measures voltage, current, phase, impedance, and harmonics. It supports multiple fundamental frequencies and provides high accuracy and time resolution. The system is suitable for monitoring plasma input parameters to ensure process stability.

Specifications
  • Voltage Range: 20 – 3000 Vrms
  • Current Range: 0.1 – 100 Arms
  • Frequency Range: 350 kHz - 300 MHz
  • Communication: USB 2.0
Overview
The document provides detailed specifications and functionalities of the Octiv Suite and Octiv Mono RF diagnostic systems, designed for measuring and analyzing RF power and plasma parameters in various applications, including semiconductor manufacturing.

Specifications
  • Octiv Suite: Measures voltage, current, phase, harmonics, impedance, and ion flux. It supports up to 5 simultaneous fundamental frequencies with a maximum RF power of 12.5kW. The system features a touch screen LCD display and various connectivity options including USB 2.0, RS-232, and Ethernet.
  • Octiv Mono: Focuses on measuring real, forward, and reflected power, as well as impedance. It is calibrated for five fundamental frequencies and offers a power range from 0 to 12 kW.

Functionalities
  • Both systems provide time-averaged, time-resolved, and time trend analysis, along with Smith chart capabilities.
  • The Octiv Suite offers waveform reconstruction and plasma diagnostic capabilities.
  • The Octiv Mono is designed for precision RF power measurement, immune to harmonics, and suitable for various laboratory applications.

Accuracy and Resolution
  • Voltage and current accuracy is ±1%, with a resolution of 0.25V and 10mA respectively.
  • Phase accuracy is ±1º, with a resolution of 0.01º.
  • Harmonic accuracy is ±5%, and frequency accuracy is ±10kHz.

Applications
The systems are used for improving production yields, tool matching, fault detection, and ensuring process stability in semiconductor manufacturing and other RF power applications.

Contact Information
Impedans Ltd., Dublin, Ireland. Phone: +353 1 842 8826, Email: [email protected], Website: www.impedans.com
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Catalog excerpts

Impedans Instrument Catalogue-1

>'w % Impedans /,. I PLASMA MEASUREMENT Instrument Catalogue

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Impedans Instrument Catalogue-2

Table of Contents Substrate Ion Interactions 6 Semion System | Ion Energy Distribution Measurement System 8 Vertex System | Ion Angular and Energy Distribution Measurement System 10 Quantum System | Neutral Fraction and Ion Energy Measurement System 12 Species System | Ion Mass and Energy Measurement System 14 Bulk Plasma Parameters 16 Langmuir Probe | Plasma Parameter Characterisation System 18 Plato Probe | Process Compatible Plasma Measurement System 20 Bdot Probe | RF Plasma Magnetic Field Measurement System 22 Atmospheric Plasma Parameters 24 Atmospherix Probe...

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Impedans Instrument Catalogue-3

Plasma Measurement to Understand and Control the Future Impedans focus exclusively on innovative plasma measurement systems incorporating unique expertise built up over many years of experience. We believe the right plasma measurement products and ongoing expertise will enable our customers to better understand and control their processes. The knowledge and understanding gained by our customers help them create value and stay ahead of the competition.

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Impedans Instrument Catalogue-4

Substrate Ion Interactions Interactions of ions at a substrate play a major role in plasma processing. The ability to quantify the flux and energy of ions impacting a surface is crucial for optimising process conditions. System Comparison Chart

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Impedans Instrument Catalogue-5

Measuring Parameters Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe Enclosure and Holder Material RFEA Probe Cable Length “The Semion retarding field energy analyser allows users to change their plasma input parameters such as power, pressure, frequencies and chemistries in real time to find their optimum ion energy and ion flux for their application.” 1 - 13...

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Impedans Instrument Catalogue-6

Learn more about this system Vertex System Ion Angular Distribution Measuring Parameters Ion Angle Resolution Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe Enclosure and Holder Material RFEA Probe Cable Length “By measuring the uniformity of ion angular distribution from different locations the user can identify changes in their process and troubleshoot input...

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Impedans Instrument Catalogue-7

Learn more about this system Ion Energy Range Ion Current IEDF Resolution Crystal Measurement Channels Deposition as a Function of Time showing Flux Fraction Quantum System Measuring Parameters Crystal Monitor Frequency Range Mass Resolution (at sensor surface) Film Thickness Resolution (Copper) Measurement Update Rate Mass Resolution (at crystal) Frequency Resolution Total deposition rate versus neutral deposition rate in a plasma deposition chamber Deposition as a Function of Average Ion Energy Holder Diameter Holder Thickness RF Bias Frequency Range RFEA probe holder mounted on electrode Probe...

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Impedans Instrument Catalogue-8

Measuring Parameters Ion Mass and Energy Ion Mass Resolution Ion Mass Range Ion Energy Range Ion Current Ion Flux IEDF Resolution Probe Bias Conditions Max RF Bias Voltage Bias Frequency Range (Time Averaged Measurements) Bias Frequency Range (Time Resolved Measurements) Time Resolution Ion mass spectrum in an Argon Oxygen plasma RFEA Probe Energy Spectrum “Ion mass and energy can now be measured on a biased substrate using a miniaturized 5mm thick sensor." Number of Sensors Probe Configuration Button Probe Diameter Holder Diameter Holder Thickness Max Operating Temperature Mounting Probe Enclosure...

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Impedans Instrument Catalogue-9

Bulk Plasma Parameters The parameters that make up the bulk of the plasma such as plasma potential, plasma density, ion density, electron energy and electron temperature can be measured giving greater understanding of the bulk plasma.

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Impedans Instrument Catalogue-10

Learn more about this system Measuring Parameters Plasma Potential Plasma Density Electron Temperature Spatial Resolution Electron Energy Distribution Function Bulk Plasma Parameters Floating Potential Langmuir Probe Langmuir Probe Specifications Plasma Power Source Probe Length Probe Diameter Probe Customisation 90°, 45° bend (custom available) Maximum Operating Temperature “The Langmuir Probe is by far the best commercial Langmuir Probe on the market, with its ultra fast repeatable measurements. Now the system includes a Single and Double Langmuir Probe as standard.” DC, RF, microwave, continuous,...

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Impedans Instrument Catalogue-11

Learn more about this system Process Compatible Plasma Measurement System Measuring Parameters Plato Probe Measurements Plasma Density Electron Temperature Plato Probe Curve with precursor added Curve without precursor Plato Probe Specifications Plasma Power Source RF Plasma Probe Length Probe Diameter Probe Customisation Maximum Operating Temperature DC, RF, microwave, continuous, pulsed plasma Current and voltage characteristic with and without depositing precursor Time Resolved Ion Density 9 1015 Linear Drive Step Resolution Control Mechanism Automated through software Drive Length Current...

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Impedans Instrument Catalogue-12

Learn more about this system z Magnetic Flux Strength Bdot Probe Specifications RF, continuous, pulsed plasma Probe Length Probe Diameter Single Probe Loop Radius Double Probe Loop Radius Probe Customisation 90°, 45° bend (custom available) Maximum Operating Temperature Linear Drive Step Resolution Control Mechanism • Time averaged • Time resolved • Time trend Bdot linear drive Bdot replaceable tips Bdot replaceable shaft Time-resolved measurements Time averaged measurements External trigger The Bdot Spatial Probe is used in most sectors using RF plasma across industry and research, such as etching,...

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Impedans Instrument Catalogue-13

Atmospheric Plasma Parameters Plasmas used in applications at high pressures have become more prevalent in recent years. The ability to measure and understand the plasma parameters gives great insight into the processes.

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