>'w % Impedans //. I PLASMA MEASUREMENT Instrument Catalogue

Substrate Level Measurement 6 Semion System | Ion Energy, Ion Flux and Uniformity Analysis 8 Vertex System | Ion Energy Distribution 10 Quantum System | Ion & Neutral Deposition Rate Monitor 12 Bulk Plasma Measurements 14 Langmuir Probe | Plasma Volume Characterisation 16 Plato Probe |Deposition Tolerant Plasma Measurement System 18 Power Delivery, Process Monitoring & Fault Detection 20 Octiv Poly | Multi Frequency In-line RF Voltage, Current, Phase, Impedance and Harmonic Measurement System 22 Octiv Suite | Multi-Frequency RF system with Plasma Diagnostic and Complex...

Plasma Measurement to Understand and Control the Future Impedans focus exclusively on innovative plasma measurement systems incorporating unique expertise built up over many years of experience. We believe the right plasma measurement products and ongoing expertise will enable our customers to better understand and control their processes. The knowledge and understanding gained by our customers help them create value and stay ahead of the competition.

1 « » Substrate Level Measurement Interactions of ions at a substrate play a major role in plasma processing. The ability to quantify the flux and energy of ions impacting a surface is crucial for optimising process conditions. System Comparison Chart

"The Semion retarding field energy analyser allows users to change their plasma input parameters such as power, pressure, frequencies and chemistries in real time to find their optimum ion energy and ion flux for their application.” Measures • Ion energy distribution • Ion flux • Postive / negative ions • Average Ion Energy • Electrode Voltage (Vdc) • Uniformity* Functionality • Time averaged • Time resolved • Time trend Features • Up to 13 measurement points • Simultaneous measurement • Replaceable button probe sensors • Custom sensor holder-plates • Energy levels up to 2500eV • User friendly...

IEDF Resolution Feed-Through Assembly Flange Type Control Unit Electronics Grid Voltage Range Current Range Connectivity SYNC Signal Specification Ion Energy Distributions measured at at various power levels Ion Energy as a Function of Chemistry Ion Energy Distrubtions Measured for different Helium Concentrations Ion Energy as a Function of Frequency Probe Bias Conditions Max RF Bias Voltage 1kV pk-to-pk Max DC Bias Voltage -1940 V Bias Frequency Range (Time 100kHz to 80MHz Averaged Measurements) Bias Frequency Range (Time 0Hz to 100kHz Resolved Measurements) Time Resolution 100 µs * For pulsed...

"By measuring the uniformity of ion angular distribution from different locations the user can identify changes in their process and troubleshoot input parameters affecting it.” Measures • Ion energy • Ion flux • Negative ions • Bias voltage Functionality • Time averaged • Time trend Features • Vertex advanced electronics unit • Analytical software suite • Range of sensor holder arrays • Replaceable button probe sensors • Quick start and advanced user modes The Vertex Multi Sensor measures the ion energy distrubtion as a function of aspect ratio from multiple locations across a substrate holder. The...

Measuring Parameters Aspect Ratio Range 0.5 to 20 Aspect Ratio Resolution 0.5 Ion Energy Range 2000 eV - Vdc Ion Current 1 mA DC max Ion Flux Ranges* Low 0.001 to 3 (A m-2) Standard 0.01 to 50 (A m-2) High 0.1 to 700 (A m-2) IEDF Resolution ± 1eV nominal *Choice dependend on plasma density Probe Bias Conditions Max RF Bias Voltage 1kV pk-to-pk Max DC Bias Voltage -1940 V Bias Frequency Range (Time 100kHz to 80MHz Averaged Measurements) Bias Frequency Range (Time 0Hz to 100kHz Resolved Measurements) Time Resolution 100 µs *For pulsed plasma with Vertex mounted on a grounded or floating electrode...

Learn more about this system Quantum System Ion Neutral Deposition Rate Monitor “The ion flux fraction at multiple locations is now measurable. This offers our clients a unique view into their plasma process with never before seen detail.” Ion neutral fraction Deposition rate Ion energy Ion flux Bias voltage Functionality • Time averaged • Time trend Features • Quantum electronics unit • Advanced analytical software suite • Replaceable button probe sensors • Quick start and advanced user modes The Quantum Multi Sensor is an energy resolving gridded quartz crystal microbalance, used to measure...

IEDF Resolution Deposition as a Function of Time showing Flux Fraction Crystal Monitor Frequency Range Frequency Resolution Ions and Neutrals Neutrals Mass Resolution (at crystal) Mass Resolution (at sensor surface) Film Thickness Resolution (Copper) Measurement Update Rate Total deposition rate versus neutral deposition rate in a plasma deposition chamber Deposition as a Function of Average Ion Energy RFEA Probe 4-grid plus Quartz crystal Button Probe Diameter Holder Diameter Holder Thickness RF Bias Frequency Range Mounting Probe Enclosure and Holder Material RFEA Probe Cable Length RFEA probe...

The parameters that make up the bulk of the plasma such as plasma potential, plasma density, ion density, electron energy and electron temperature can be measured giving greater understanding of the bulk plasma.

Learn more about this system Langmuir Probe Plasma Volume Characterisation “The Langmuir Probe has ultra fast repeatable measurements and includes a Single and Double Langmuir Probe as standard.” Floating potential (Single only) Plasma potential (Single only) Plasma density Ion current density Electron energy distribution function (Single Only) Functionality • Time averaged • Time resolved • Time trend Features • Langmuir probe automated electronics unit • Advanced analytical software suite • Replaceable probe head • Quick start and advanced user modes • Integrated air cooling • External trigger...