Catalog excerpts
High-throughput PVD The versatile InlineCoater™ PVD (physical vapor deposition) system employs load-lock and multiple chamber parallel processing. The result, very short cycle times and a large variety of high-quality PVD coatings suitable for modern production.
Open the catalog to page 1PVD for modern production flows Unlike traditional PVD tools, the unique design of the InlineCoater makes it well suited for continuous production flows, by handling small loads at a very high throughput. The result is both higher productivity and lower cost than competing PVD solutions, for a wide range of products. DESIGNED FOR SHORT CYCLE TIMES APPLICATION EXAMPLES The InlineCoater load-lock allows re-loading of parts The systems are used for a wide range of decorative simultaneously with PVD processes running at full power and functional coatings on metal products, e.g. wear in three...
Open the catalog to page 2Top Coat Base Coat Substrate 4 μm The flexible platform of the InlineCoater allows full use of state-of-the-art PVD processes, based on magnetron A highly wear resistant decorative coating is created with a base coat and a ceramic top coat. Load-lock (LL) sputtering and cathodic arc evaporation. It can also be equipped for HiPIMS and PE-CVD. Various plasma techniques are used for clean-etching and coating passivation. Reactive gases, e.g. O2, N2, CH4 and Clean etch Top Coat Ventilation Un-load Load Base coat Base coat Reactive process (e.g. O2, N2, CH4, C2H2) Optical feedback control C2H2,...
Open the catalog to page 3Technical data Process chamber size (LxW) Process chamber height (adaptable) Process chambers Load-lock Process options Deposition source orientation Number of deposition sources Gas supply system Base pressure Cycle time, from System dimensions System weight 300x180 mm (oval) 515x315 mm (rectangular) 50-150 mm 75-150 mm 3 3 Yes Yes DC magnetron sputtering DC magnetron sputtering Cathodic arc evaporation Cathodic arc evaporation HiPIMS HiPIMS PE-CVD PE-CVD Pulsed plasma clean etching Pulsed plasma clean etching Substrate biasing Substrate biasing Reactive process Reactive process Optical...
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