InlineCoater
4Pages

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Catalog excerpts

InlineCoater - 1

High-throughput PVD The versatile InlineCoater™ PVD (physical vapor deposition) system employs load-lock and multiple chamber parallel processing. The result, very short cycle times and a large variety of high-quality PVD coatings suitable for modern production.

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InlineCoater - 2

PVD for modern production flows Unlike traditional PVD tools, the unique design of the InlineCoater makes it well suited for continuous production flows, by handling small loads at a very high throughput. The result is both higher productivity and lower cost than competing PVD solutions, for a wide range of products. DESIGNED FOR SHORT CYCLE TIMES APPLICATION EXAMPLES The InlineCoater load-lock allows re-loading of parts The systems are used for a wide range of decorative simultaneously with PVD processes running at full power and functional coatings on metal products, e.g. wear in three...

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InlineCoater - 3

Top Coat Base Coat Substrate 4 μm The flexible platform of the InlineCoater allows full use of state-of-the-art PVD processes, based on magnetron A highly wear resistant decorative coating is created with a base coat and a ceramic top coat. Load-lock (LL) sputtering and cathodic arc evaporation. It can also be equipped for HiPIMS and PE-CVD. Various plasma techniques are used for clean-etching and coating passivation. Reactive gases, e.g. O2, N2, CH4 and Clean etch Top Coat Ventilation Un-load Load Base coat Base coat Reactive process (e.g. O2, N2, CH4, C2H2) Optical feedback control C2H2,...

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InlineCoater - 4

Technical data Process chamber size (LxW) Process chamber height (adaptable) Process chambers Load-lock Process options Deposition source orientation Number of deposition sources Gas supply system Base pressure Cycle time, from System dimensions System weight 300x180 mm (oval) 515x315 mm (rectangular) 50-150 mm 75-150 mm 3 3 Yes Yes DC magnetron sputtering DC magnetron sputtering Cathodic arc evaporation Cathodic arc evaporation HiPIMS HiPIMS PE-CVD PE-CVD Pulsed plasma clean etching Pulsed plasma clean etching Substrate biasing Substrate biasing Reactive process Reactive process Optical...

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