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Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes

Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes

Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes

Product catalog summary
Introduction
High harmonics generated from the interaction of intense femtosecond lasers with gases are increasingly used in various fields such as biology, chemistry, material science, and atomic physics. These harmonics, spanning from a few tens of eV to a few keV, exhibit full spatial and high temporal coherence, making them suitable for coherent imaging experiments and ultrashort EUV light bursts. The optimization of intensity on target is crucial for exploring non-linear phenomena in the EUV range.

Wavefront Sensors
Imagine Optic's wavefront sensors, particularly the HASO EUV, are essential tools for optimizing high harmonic beams. These sensors provide high spatial sampling rates and can capture wavefront deformations and intensity distributions, guiding improvements in beam quality. They are crucial for achieving high intensities and optimizing complex focusing optics.

Materials and Methods
The document describes various wavefront sensors available, including the standard HASO EUV with a 72x72 hole array and a high numerical aperture version. Customizable options are also available for specific applications, such as extending the energy range or increasing the number of pupils.

Direct Optimization
The HASO wavefront sensor can directly optimize harmonic emissions by adjusting interaction parameters between the laser and target. It allows for on-line optimization and long-term monitoring of harmonic wavefronts. The sensor can record the full electric field, enabling intensity and wavefront mapping at various distances.

Conclusion
Imagine Optic's wavefront sensors are indispensable for optimizing high harmonic beamlines, ensuring diffraction-limited beams and high Strehl ratios. Their achromatic nature and wide spectral sensitivity make them ideal for measuring and optimizing attosecond pulses.

References
The document cites several scientific publications that support the findings and applications discussed.
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Catalog excerpts

Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes-1

Optimization of high harmonic beam line: from the source to the focal spot Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France [email protected] Summary Today, high harmonics generated by the interaction of intense or ultra-intense lasers with gaseous or solid targets have reached extremely high level of robustness and performances. Thus there is a huge amount of new fully integrated experimental facilities emerging for applications such as in non-linear EUV optics and physics, material science, and biological imaging. These facilities are conceptually close to beamlines on free-electron lasers with the difference that the sources are the high harmonics. The transport of fully coherent, ultra-short pulses (high harmonic pulses reached 70 attoseconds) over meters needs to be controlled. A very accurate control and eventually correction of the beam wavefront all over the beamline aims achieving ultra-high intensities or to be used for coherent imaging. Imagine Optic’s wavefront sensors have demonstrated to be an excellent tool for optimizing the high harmonic’s beam thus reaching /20 (at 30 nm) root-mean-square (rms) residual wavefront aberration while preserving a strong emission. Also Imagine Optic’s wavefront sensors showed excellent performances in measuring the optical quality of mirrors used on high harmonic beamlines. A few examples are flat or curved optics being either static (polished shape) or dynamically curved (bender technology). Imagine Optic’s wavefront sensor or HASO EUV installed on high harmonic beamline is an indispensable tool for control and delivery day-to-day diffraction-limited beams to users. Optimization of high harmonic beamline: from the source to the focal spot N.Varkentina www.imagine-optic.com 5 October 2020 – Property of Imagine O

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Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes-2

Introduction Nowadays high harmonics generated (HHG) from the interaction of intense, femtosecond laser with gas are becoming a common tool for applications from Biology, Chemistry, material Science, to atomic Physic. The high harmonics span from typically few tens of eV to few keV, for the most advanced. This spectral range is often called as “XUV” or “EUV” and “tender x-rays”, for the highest energies. High harmonic exhibits two important characteristics: full spatial and high temporal coherences. The first characteristic has been widely used to downscale the coherent imaging experiments such...

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Optimization of high harmonic beam line: from the source to the focal spot - X-EUV optical metrology Application Notes-3

Direct optimization of high harmonic beams HASO wavefront sensor may be used to directly optimize harmonic’s emission by modifying the parameters of the interaction between the driving laser and the gas (or solid target) (see Figure 1). Figure 2 High Harmonic’s wavefront recorded over 30 consecutive shots, with independent display of the first most important aberrations (astigmatism at 0° and 45° and coma). The tilt and curvature have been removed. Thanks to the ability of recording simultaneously the amplitude and the phase of the full incoming beam, the full electric field is recordable. By...

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