Semiconductor Analyzers for Wet Process
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HORIBA Group Delivers Comprehensive Solutions to the Evolution of Semiconductor/ FPD Wet Processes Since the introduction of the chemical solution concentration monitor in 1995, HORIBA has developed a wide range of analyzers for wet processes using unique technologies. The chemical solution concentration monitor boasts a world-leading market share 1 in 300 mm semiconductor wafer cleaning processes and continues to be the industry leader. And now, the concentration monitoring of chemical solutions must play a more advanced role as a vital part of the "monitor feedback control" process...

] Overall analysis technology specialist HORIBA proprietary analysis technology is fully demonstrated in a wide range of fields - semiconductors, medicine, environment, science, and engine measurements. In semiconductors, HORIBA provides an extensive selection of process monitors for integration into manufacturing lines that aid the safe production of higher performance semiconductors. Mass flow control technology specialist A core company in the HORIBA Group's semiconductor business, HORIBA STEC boasts a world-leading market share 2 in industry-standard mass flow controllers and liquid...

Semiconductor Processes Front-end of Line Wafer grinding Developing TMAH Concentration Monitor Oxidation of wafer surface Pattern lithography on wafer surface Photo resist coating RCA Cleaning Full Process Cleaning / Etching Dissolved Ozone Monitor Support for Multi-Bath, Single-Bath, and Single-Wafer Cleaning Systems Organic material removing H2SO4/H2O2 Hydrofluoric Acid Monitor Fiber Optic Type Chemical Solution Concentration Monitor Alternate RCA Monitor CS-100 Series Dissolved Oxygen in Low Concentration HF Monitor Carbon Sensor Resistivity Meter HE-960R-GC *Please consult HORIBA...

Etching Process Back-end of Line Resist Strip Chemical Solution Monitor Polymer Removal Chemical Solution Monitor Low Concentration HF Monitor in Diluted Sulfuric Acid/ Hydrogen Peroxide Polymer removing / Resist stripping Polymer Removing/ Resist Stripping Process Cu Plating *Please consult HORIBA concerning chemical solutions. Conductivity Meter (High concentration type) Cu Plating Process Electrode formation Dissolved Oxygen in Low Concentration HF Monitor Fiber Optic Type Chemical Solution Concentration Monitor Planarization Process Hydrofluoric Acid Monitor

Fiber Optic Type In-line/ Realtime Measurement Chemical Solution Concentration Monitor In-line Type Concentration monitor In-line cell The CS-100F1 Series is equipped with fiber optics cable based on the CS-100 Series. It offers real-time, in-line measurements by directly integrating the sample cell into the cleaning system piping and by using a fiber optic cable for light signal transmission. A single concentration monitor can take up to four measurements and monitoring of multiple chemical solutions in a single-bath or singlewafer cleaning system is also possible. Fiber optic cable Cell...

Fiber Optic Type High temperature Chemical Measurement Chemical Solution Concentration Monitor Stable operation Compact body size CS-600F Series HORIBA’s fiber optic type chemical solution concentration monitor, the CS-600F, achieves a higher level of functionality best suited for manufacturing, such as the ability to perform in-line measurement of high temperature chemical solutions in various applications, stable operation for reduced downtime, and compact size for improved space productivity in order to meet the precise chemical solution concentration management required in leading-edge...

HYDROFLUORIC ACID HF Concentration Monitor Optional HF value correction unit HF-960EM/CM-520L The HF-960EM is equipped with a sensor for which the wetted part is only made from PFA, so the model completely complies with the cleanliness requirement of semiconductor processes. The sensor size has been reduced as much as possible, making it possible to install the model in a small space for single wafer processing in semiconductor wet processes. The stability and repeatability have been improved compared to previous models. The HF-960EM can provide wide measurement ranges of up to HF50% and it...

HF in DSP Low Concentration HF Monitor in Diluted Sulfuric Acid/ Hydrogen Peroxide Measurement principle Relationship between the degree of HF ionization and pH HF-700 The HF-700 provides continuous and precise measurement of the low hydrofluoric concentration in the solution of diluted sulfuric acid, hydrogen peroxide and hydrofluoric acid that is used effectively in the removal of the polymer residue following the etching process. Stable and continuous measurement Continuous and precise measurement of the fluoride ion (ionized hydrofluoric acid) is achieved using automatic neutralizing...

TMAH/Citric Acid/KOH Chemical Concentration Monitor Measurement principle Conductivity (k) = HE-960H-TM Series HE-960CA HE-960H-KOH HORIBA Conductivity based chemical concentration monitors offer precision measurement of various chemicals ( TMAH, Citric acid and KOH). These monitors can be used simply for conductivity meter as well. HORIBA uses high chemical resistant 4-electrode sensor to offer wide range of measurement. Automatic decimal point adjustment enables a wide range measurement of various chemicals. Automatic range switching from high to low concentrations Enables three type of...

CONDUCTIVITY Conductivity Meter Measurement principle HE-960HC(High concentration type) HE-960LC(Low concentration type) The sensor is a glassy carbon electrode that is highly resistant to chemicals. This allows the system to perform in-line measurements in high-stress environments. The concentration conversion feature makes it possible to operate the system in % display mode. Wide range compatibility Concentration conversion function (e.g. H2SO4, H3PO4, KOH, NaOH, etc.) Equipped with a variety of control features, including transmission output (4 points), contact output (5 points) and...

V Carbon Sensor Resistivity Meter Measurement principle HE-960R-GC (1ch) HE-960RW-GC (2ch) The HE-960R-GC and HE-960RW-GC are resistivity meters using glassy carbon for its sensor. A glassy carbon sensor is not contaminated by metal elution and is chemically resistant to wet cleaning solutions such as hydrofluoric acid and hydrogen peroxide. The glassy carbon surface of its sensor is specially processed so that particle elution is also kept extremely small. It is especially effective for resistivity measurements in the rinse process of single-bath cleaning systems and it enables high...