ULTIMA 2
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Catalog excerpts

ULTIMA 2 - 1

ULTIMA 2 The Ultimate in ICP-OES High Performance in ICP-OES High Quality Spectrometer Analyst Software Explore the future Explore the future Automotive Test Systems | Process & Environmental | Medical | Semiconductor | Scientific Automotive Test Systems | Process & Environmental | Medical | Semiconductor | Scientific

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ULTIMA 2 - 2

High performance in ICP-OES ULTIMA 2 ICP Optical Emission Spectrometer combines simplicity and high performance ULTIMA 2 is based on a versatile platform to match actual and future needs of your laboratory. The knowledge of HORIBA Scientific in manufacturing ICP-OES and high quality optics were combined to provide the highest performance in ICP-OES. ULTIMA 2 is the only instrument able to provide an analytical answer for almost any matrix. RESOLUTION The one meter focal length monochromator associated with the high density holographic grating and advanced PMT detection offers the best...

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ULTIMA 2 - 3

SENSITIVITY The total plasma view concept, using a vertical torch and radial viewing with the measurement of the whole Normal Analytical Zone allows running the most difficult matrices with the highest performance due to low matrix effects and enhanced sensitivity. Radial viewing reduces matrix effects, simplifying the analysis and improving detection limits in real samples. VERSATILITY ULTIMA 2 can be tailored to your specific needs. The Far UV kit allows measuring wavelengths down to 120 nm, offering halogens analysis capability and the use of alternative wavelengths for many elements....

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ULTIMA 2 - 4

High quality ICP-OES Spectrometer Excellence in ICP-OES design with attention on every component • Spacious sample introduction area with corrosion resistant sample tray for the analysis of all types of samples and for the use of a wide variety of sample introduction systems. • uick release and quick mount torch design Q in a large plasma compartment with no adjustment required. Multi-user operation is thus facilitated, providing excellent reproducibility. • ertical torch and Total Plasma View concept V providing optimum sensitivity and reduced matrix effects, for both aqueous and organic...

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ULTIMA 2 - 5

Unique PMT technology dedicated to ICP-OES High precision can be obtained using the true simultaneous measurement of an internal standard, only available with PMT detectors. This measurement can be done on a dedicated reference monochromator or on the optional polychromator. Cd from 0.001 to 1000 mg/L 1 000 000 000 ULTIMA 2 is equipped with the patented High Dynamic Detection system, exclusively available from HORIBA Scientific. The dynamic range is enhanced, with up to 10 orders of magnitude. The adjustment of the gain is done within milliseconds without hysteresis, allowing full spectrum...

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ULTIMA 2 - 6

Analyst Software Analyst software extends instroment capability and Analyst provides a data audit trail for users and instrument operation. 21 CFR Part 11 compliance is obtained through a powerful SQL Server database ensuring integrity of raw data and traceability of operations. Enhanced productivity with automated analysis thanks to multiple methods sequence, programmable recalibration and automated QC checks with user defined actions, in combination with the autosampler. User rights management is available for enhanced security and management of access levels for each analyst. Import and...

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ULTIMA 2 - 7

CLIP: Collection of Line Intensity Profiles Line selection is the crucial part of method development. As high resolution ICP-OES are often dedicated to the analysis of complex matrices with more risk of spectral interferences, this step can Pe difficult and time consuming. Using the CLIP will shorten the time needed for line selection and enhance the reliability of the resulting method. CLIP stands for Collection of Line Intensity Profiles. The CLIP is dedicated to the PMT- based instruments of the ULTIMA 2 Family and can be used with older instruments. Using the proprietary ICP-based...

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ULTIMA 2 - 8

TECHNICAL SPECIFICATIONS Generator Cooling system Exhaust Plasma Sample introduction • ual back-to-back gratings (4320 g/mm and 2400 g/mm) used in the 1st D order offering resolution < 6 pm for 160-430 nm and < 10 pm for 430-800 nm. • Far UV kit for sensitive measurement of wavelength down to 120 nm • AS-500 Autosampler with optional rinse station • Ar humidifier • Micro/high dissolved solids/inert material/iorganic nebulizers • Scott/HF resistant/cooled spray chambers • Ultrasonic nebulizer • MA for simultaneous measurement of hydride forming elements and other C elements • Oxygen kit for...

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