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Pulsed RF GD OES

Pulsed RF GD OES

Pulsed RF GD OES

Product catalog summary
Introduction
Pulsed RF Glow Discharge Optical Emission Spectrometry (GD-OES) is a technique for ultra-fast elemental depth profiling, effective for both thin and thick layers, surpassing limitations of techniques like XPS or SIMS for layers over 1 micrometer.

Specifications and Capabilities
GD-OES measures all elements, providing quantitative depth profiles from the first nanometer to over 150 microns. It is applicable in protective coatings, multilayer structures, and substrate analysis, offering high sensitivity and rapid analysis with a typical time of 2 minutes and a crater diameter of 4 mm.

Applications
Used in fields such as photovoltaics, LED manufacturing, hard disks, and corrosion protection, GD-OES is ideal for process control and material studies, providing immediate feedback for optimization.

Technical Features
Utilizing a pulsed RF source and an emission spectrometer, GD-OES allows for high-resolution and high-sensitivity measurements. The GD-Profiler series offers models with options for different applications, minimizing matrix effects for easy calibration and quantification.

Standards and Validation
Supported by international standards and scientific literature, GD-OES is established in material science, enabling simultaneous measurement of all elements of interest due to its high sensitivity and fast optical detection.

Unique Source Design
Features like double differential pumping and pulsed RF operation are crucial for extreme surface measurements and minimizing redeposition, operating at low pressure without ultra-high vacuum conditions.

Detection System
The optical system covers a wide spectral range with high-resolution gratings for optimal light collection, allowing for the addition of a high-resolution monochromator for specific research needs.

Conclusion
Pulsed RF GD-OES is a versatile tool for material analysis, offering rapid, high-resolution depth profiling across various applications, making it essential for modern material science.
Introduction
This document outlines the capabilities and applications of HORIBA Scientific's Glow Discharge (GD) instruments for material analysis, emphasizing the advantages of High Dynamic Detection (HDD) and Quantum software for efficient measurements.

Specifications and Features
GD instruments offer a wide dynamic range, detecting elements from sub-ppm to 100% within depth profiles. HDD eliminates pre-adjustments of voltages, simplifying the process, while the monochromator records the entire emission spectrum with high optical resolution.

Procedures and Applications
GD instruments acquire the full fingerprint of bulk samples in two minutes, enabling material comparison through emission spectra. They analyze non-conductors without surface charging effects and provide nanometer depth resolution, complementing techniques like XPS and SEM.

Software and Data Handling
The Quantum software offers a user-friendly interface for instrument control and data management, supporting multitasking and multilingual operations with functionalities like Time Plus, Ultra Fast Sputtering (UFS), and real-time data display.

Standards and Recommendations
GD instruments adhere to ISO standards for sputtering rate mode and offer advanced layer mode for material analysis, supporting multiple gases and providing integrated libraries of reference materials and sputtering rates.

Additional Information
HORIBA Scientific, a leader in GD technology for over 15 years, has a global presence and dedicated support staff, hosting the International GD Day biennially to foster collaboration and showcase GD technology developments.
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Catalog excerpts

Pulsed RF GD OES-1

Pulsed RF Glow Discharge Optical Emission Spectrometry Ultra Fast Elemental Depth Profiling

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Pulsed RF GD OES-2

Pulsed RF Glow Discharge Op tical Emission Spectrometry Quantitative Elemental Depth Profile Analysis from the first nanometer down to more than 150 microns 1-100 nm 10-1000 nm Protective coatings multilayered (thin films PV, LED, hard disks, electrodes for Li Native oxide (few nm) Corrosion protection Tribological improvement Structure: Multilayer, Gradient, Elemental composition Interface details Layer intermixing Compound formation Most materials today are either Adhesion improvement Element inter-diffusion Substrate protection Speed & depth resolution With a typical erosion rate of µm/min...

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Pulsed RF GD OES-3

A multidimensional platform for material analysis Electrodes of Li ion batteries are readily measured with the Pulsed RF GD-OES. Strategies for sample handling (including the Li bell for air sensitive materials) have been developed. The patented UFS assures that the sputtering is equally fast on positive and negative electrodes. Ref: HORIBA Scientific Application note n°18 Deposition process control Pulsed RF GD-OES data allow following N and C profiles in depth, together with all other elements to control nitruration processes and are correlated to hardness testings. Pulsed RF GD-OES is ideal...

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Pulsed RF GD OES-4

Why the source makes the difference Source principle The source is central to the operation of the instrument and accounts for many of its specific characteristics. Unique source design The design of the HORIBA Scientific source has unique features that are essential for the advanced performance of the instruments. T he two mechanisms of sputtering and excitation are spatially separated. The sputtering is material dependent, but the emission taking place in the gas phase is nearly independent from the material. This absence of matrix effects is a clear advantage over Secondary Ion Mass Spectrometry...

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Pulsed RF GD OES-5

Why light matters Flexibility: the true n+1 detection A confined plasma source Even with the most complete line array, there could always be a need to measure an n+1 element for new research, to trace nano-particles added within a layer, to evaluate the impact of the addition of a minor element in the absorber layer of a PV cell on the efficiency of this cell, or to look at a new film deposit. The GD plasma is confined within the anode tube. 4 mm is the optimum anode diameter. Smaller anodes are available but they reduce the amount of light, and side walls effects become non-negligible. Larger...

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Pulsed RF GD OES-6

A multidimensional platform f or material analysis Software Multitasking and multilingual, Quantum software offers easy access to all the functionalities of the instrument (control of poly and mono operation, management of the patented PolyscanTM pulsed operation, etc.). Quantum can be used for data treatment on other computers in emulation mode while the instrument is making measurements. V 22 Overlay of measurements to study a varying process Powerful and flexible data handling with the unique functionalities of Time Plus (to increase analysis time during measurement), UFS (Ultra Fast Sputtering)...

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Pulsed RF GD OES-7

Look at the Surface and Beyond... 4 GD Labs at your service Paris - New York - Tokyo - Shanghaï HORIBA Scientific's New R&D centre in Paris Saclay with the world's largest scientific gratings facility We know GD and its multiple application possibilities! The International GD Day, held every 2 years, gathers practitioners and researchers interested in all aspects of analytical GD for surface and depth profile analysis of materials. Presentations made by the users cover a wide variety of application topics. The GD Day also gives attendees the opportunity to see the latest instrument developments...

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.