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GD OES for ultra fast elemental depth profiling

GD OES for ultra fast elemental depth profiling
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GD OES for ultra fast elemental depth profiling

Product catalog summary
Introduction
Pulsed RF Glow Discharge Optical Emission Spectrometry (GD-OES) is a technique designed for ultra-fast elemental depth profiling, capable of analyzing from the first nanometer to over 150 microns. It is particularly useful for studying protective coatings, complex multilayer structures, and substrates.

Specifications and Capabilities
GD-OES offers high sensitivity and resolution, suitable for both thin and thick layers, and can analyze conductive or insulating materials. It uses a pulsed RF glow discharge source with an emission spectrometer to measure all elements in real-time. The GD-Profiler series, including models like GD Profiler 2 and GD Profiler HR, caters to a wide range of applications.

Applications
GD-OES is utilized in fields such as photovoltaics, LED manufacturing, hard disk production, and lithium battery electrode analysis. It is also applicable for nitruration processes, zinc coatings, and glass cationic exchange. The technique complies with ISO standards and provides rapid feedback for process optimization.

Advantages Over Other Techniques
Compared to XPS, SIMS, and SEM EDX, GD-OES offers faster analysis, the ability to measure all elements, and minimal matrix effects, making it ideal for both thin and thick layers.

Technical Features
The pulsed RF source allows for high instantaneous power without thermal effects. The design includes features like double differential pumping for stable pressure distribution. The optical system covers a wide spectral range and uses high-resolution gratings for optimal light collection.

Detection and Measurement
The system uses a High Dynamic Detector (HDD) for accurate measurement across a wide dynamic range. The detection system matches the speed of erosion, ensuring precise measurements of rapid concentration changes in thin films.

Conclusion
Pulsed RF GD-OES is a versatile and powerful tool for material analysis, offering rapid, high-resolution depth profiling across a wide range of applications.

Introduction to HORIBA Scientific Instruments
The document discusses the capabilities and features of HORIBA Scientific's instruments for material analysis, focusing on Glow Discharge (GD) techniques. It highlights the advantages of using High Dynamic Detection (HDD) and Quantum software for efficient and precise material analysis.

Specifications
The instruments offer a linear dynamic acquisition range of 5x109, allowing measurement of elements from sub ppm to 100% within depth profiles. The use of HDD eliminates the need for pre-adjustments of voltages, saving time and simplifying the process.

Procedures
Using a monochromator in scanning mode, the entire emission spectrum of a material can be recorded with high optical resolution. The acquisition of a full fingerprint of bulk samples takes two minutes, and materials can be compared through their "Images".

Software Features
Quantum software provides a multidimensional platform for material analysis, offering functionalities like Time Plus, Ultra Fast Sputtering (UFS), and real-time data display. It supports multitasking and multilingual operations, allowing data treatment on other computers in emulation mode.

Data Handling and Analysis
The software allows for flexible data handling, including real-time display, ultra-fast treatment options, and automatic determination of interfaces. It supports the creation of analytical tasks for overlay and comparison of multiple results.

Instrument Control
The instruments offer control of plasma parameters in both pulsed and non-pulsed modes, with features like plasma cleaning and use of multiple gases. Integrated libraries of reference materials and on-line Statistical Process Control (SPC) are included.

Applications and Coupling
GD techniques are complementary to other methods like XPS, Ellipsometry, and micro Raman measurements, providing comprehensive material analysis. The document also mentions the benefits of coupling GD with SEM for enhanced surface and cross-section observations.

Global Presence and Support
HORIBA Scientific has a global presence with R&D centers and GD labs in Paris, New York, Tokyo, and Shanghai. The company organizes the International GD Day to foster collaboration and showcase the latest developments in GD technology.

Conclusion
HORIBA Scientific is a leader in GD technology, offering advanced solutions for surface and depth profile analysis. Their instruments and software provide precise, efficient, and flexible material analysis capabilities.
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Catalog excerpts

GD OES for ultra fast elemental depth profiling-1

Pulsed RF Glow Discharge Optical Emission Spectrometry Ultra Fast Elemental Depth Profiling

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GD OES for ultra fast elemental depth profiling-2

Pulsed RF Glow Discharge Op Quantitative Elemental Depth Profile Analysis from the first nanometer down to more than 150 microns 1-100 nm 10-1000 nm Protective coatings multilayered (thin films PV, LED, hard disks, electrodes for Li Native oxide (few nm) Corrosion protection Tribological improvement Structure: Multilayer, Gradient, Elemental composition Interface details Layer intermixing Compound formation Most materials today are either Adhesion improvement Element inter-diffusion Substrate protection batteries, coated glasses, etc.) or feature surface treatments Complex coatings and advanced...

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GD OES for ultra fast elemental depth profiling-3

tical Emission Spectrometry Speed & depth resolution With a typical erosion rate of µm/min (2-10 nm/s), researchers are encouraged to run multiple samples. The immediate feedback allows them to optimize and control each stage of their evaporation, deposition or annealing processes and to quickly react to any observed variation. Pulsed RF GD-OES offers superb depth resolution down to the nanometer scale or below, made possible by the unique characteristics of the advanced pulsed RF GD source and the Ultra Fast Detection capability of the optical system. Sub nm depth resolution Mirror for X-ray,...

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A world of GD applications Li Batteries: Positive & Negative Electrodes Thick layers, fragile samples, handling strategies Electrodes of Li ion batteries are readily measured with the Pulsed RF GD-OES. Strategies for sample handling (including the Li bell for air sensitive materials) have been developed. The patented UFS assures that the sputtering is equally fast on positive and negative electrodes. Ref: HORIBA Scientific Application note n°18 Nitruration GD results correlate with mechanical testing Pulsed RF GD-OES data allow following N and C profiles in depth, together with all other elements...

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LED Deposition process control Pulsed RF GD-OES is ideal for fast control of the active layers of the LED offering the chance for immediate reaction in case of process drift. Ref: HORIBA Scientific Application note n°19 GD is one of the rare surface techniques capable of measuring H The excellent optical resolution of the instrument even allows simultaneous measurements of H, and its isotope Deuterium, which is of great interest for nuclear research. Ref: Fusion Engineering and Design 87 (2012) 1091– 1094 P-GaN InGaN/GaN Sapphire substrate Pulsed RF GD plasma reveals the structure of the material...

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Why the source makes the Source principle The source is central to the operation of the instrument and accounts for many of its specific characteristics. T he two mechanisms of sputtering and excitation are spatially separated. The sputtering is material dependent, but the emission taking place in the gas phase is nearly independent from the material. This absence of matrix effects is a clear advantage over Secondary Ion Mass Spectrometry (SIMS) and allows for easy quantification. The operation of the source is easy as the sample just needs to be placed on an 'o’ ring facing the anodic tube in...

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difference Unique source design The design of the HORIBA Scientific source has unique features that are essential for the advanced performance of the instruments. T he 13.56 MHz RF plasma gas ions involved in the sputtering process have low energy (50 eV) causing negligible surface damage. The source uses double pumping with 2 separated pumps. This assures a stable pressure repartition all over the sputtered area during the entire sputtering process. Without double pumping. Local pressure at surface is not uniform, resulting in poor sputtering. With double pumping. Sample grain structure is well...

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Why light matters A confined plasma source The GD plasma is confined within the anode tube. 4 mm is the optimum anode diameter. Smaller anodes are available but they reduce the amount of light, and side walls effects become non-negligible. Larger anodes (up to 10 mm) could be used, but they do not provide optimum crater shapes. The optical design must therefore optimize the light collection. Direct observation (no fibers) and the use of the most luminous ion etched holographic diffraction gratings are therefore crucial for sensitivity. The HORIBA Scientific design is optimized for GD and does...

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Flexibility: the true n+1 detection Even with the most complete line array, there could always be a need to measure an n+1 element for new research, to trace nano-particles added within a layer, to evaluate the impact of the addition of a minor element in the absorber layer of a PV cell on the efficiency of this cell, or to look at a new film deposit. The HORIBA Scientific answer to this need for flexibility is a direct coupled (no fiber) high resolution monochromator (C) with HDD detection. The monochromator could be added at any time without loss of light in the polychromator. Ni/Cu sample....

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A multidimensional platform f Software Multitasking and multilingual, Quantum software offers easy access to all the functionalities of the instrument (control of poly and mono operation, management of the patented PolyscanTM pulsed operation, etc.). Quantum can be used for data treatment on other computers in emulation mode while the instrument is making measurements. V 22 Overlay of measurements to study a varying process Powerful and flexible data handling with the unique functionalities of Time Plus (to increase analysis time during measurement), UFS (Ultra Fast Sputtering) to enhance the...

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other surface techniques The GD plasma sputtering, though Ultra Fast, is delicate. Incident particles have a low energy (50eV) changes in the material. Coupling GD with other techniques offering different lateral resolution is therefore of great interest. XPS, Ellipsometry and micro Raman measurements have been performed within GD craters, providing multiple and same materials. with variable lateral Surface and cross section observations with SEM are also made easier and better after GD sputtering. Using the patented "UFS", fine details can be observed even on samples with thick organic layers....

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.