RGAs for Vacuum and Semiconductor Process Monitoring
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High Performance Mass Spectrometers For Vacuum and Semiconductor Process Monitoring

Detailed product information / introduction MOCVD semiconductor processing Applications: XXCVD/MOCVD XXPECVD XXALD XXSputtering XXVacuum coating XXPlasma etching XXMBE plasma etching Key Features XXRobustness and stability for permanent process monitoring XXVersatile systems for different process pressure ranges XXPrecision analyses of residual gases, detection limit to 2x10-15 mbar XXCustomised systems available XXCommunication interfaces for external data analysis in real time PC Software for process monitoring and control: This newly developed LabVIEW®-based software allows a very...

Process and Residual Gas Analyser (HPR-30 system) Hiden’s HPR-30 system is a gas analyser optimised for the analysis of gases and vapours in vacuum processes and vacuum diagnostics. XXDirect process analysis through the pressure range 10-4 mbar to 1 mbar and extendable to 1000 mbar XXUnique sampling probe orifice can be extended directly into the process region for optimised response and sensitivity XXSensitivity to 100 parts-per-billion as standard and 5 partsper-billion with optional triple stage mass filter XXIntegrated high conductance valve option for residual gas analysis at chamber...

Vacuum accessories and systems for RGA operation HMT – High Pressure RGA Vacuum process sampling Hiden’s HMT RGA system is a unique dual mode RGA that operates as a conventional RGA for vacuum diagnostics and monitoring at pressures of less than 10-4 mbar and can switch into a high pressure mode for process analysis at pressures up to 5x10-3 mbar without a requirement for differential pumping or Hiden offers vacuum sampling accessories and components that are available as bolt-on low cost modules or part of an integrated system. XXSample lines and options for sampling over a range of...

XXQuadrupole mass spectrometers provide for fast sensitive measurement of all vacuum residuals from light elements, hydrogen and helium through to volatile organic species. XXThe RGA gauge head protection accessory is recommended for applications where the RGA can be used pre-process, placing the analyser out of the line of sight of potentially harmful condensing species and isolating it when the processing at higher pressures begins. XXHiden’s range of residual gas analysers are based on high performance quadrupole mass spectrometers, and provide a unique window into the vacuum environment...

Residual Gas Analysers for vacuum process monitoring ITEM V acuum Process Sampling Systems HPR-30 Vacuum process sampling system, including HAL 201 RC mass spectrometer with Faraday and Electron Multiplier Detectors. Mass range 200 amu. Process pressure range for sampling: 1 mbar to 10-4 mbar. The sampling pressure range may be extended with special options. The HPR-30 system includes: XXRe-entrant probe with user changeable sampling orifice XXVacuum system – all dry turbomolecular pump set with total pressure gauge and safety interlock for protection of the mass spectrometer in case of...

High Pressure Residual Gas Analysers High pressure RGA system 100 amu Faraday Detector Minimum detectable partial pressure 2x10-11 mbar Maximum operating pressure 5x10-3 mbar High pressure RGA system 100 amu Faraday and Electron Multiplier Detector Minimum detectable partial pressure 2x10-13 mbar Maximum operating pressure 5x10-3 mbar RGA sytem 100 amu Faraday Detector Minimum detectable partial pressure 2x10-11 mbar Maximum operating pressure 1x10-4 mbar RGA sytem 200 amu Faraday and Electron Multiplier Detector Minimum detectable partial pressure 5x10-14 mbar Maximum operating pressure...

Hiden’s quadrupole mass spectrometer systems address a broad application range in: GAS ANALYSIS dynamic measurement of reaction gas streams catalysis and thermal analysis molecular beam studies dissolved species probes fermentation, environmental and ecological studies SURFACE ANALYSIS UHV TPD SIMS end point detection in ion beam etch elemental imaging – 3D mapping PLASMA DIAGNOSTICS plasma source characterisation etch and deposition process reaction kinetic studies analysis of neutral and radical species VACUUM ANALYSIS partial pressure measurement and control of process gases reactive...