Mass Spectrometers for Thin Films, Plasma and Surface Engineering
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THIN FILMS, PLASMA & SURFACE ENGINEERING Mass Spectrometers for Thin Films, Plasma & Surface Engineering

MASS SPECTROMETERS for Thin Films, Plasma & Surface Engineering Hiden Analytical have been designing and developing the highest quality quadrupole mass spectrometer based systems for over 35 years. We have built a reputation for delivering instruments with superior sensitivity, accuracy and reproducibility together with a first class global service and applications support network. Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles,...

Contents HMT - High Pressure Residual Gas Analyser HPR-30 & RGA - Process and Residual Gas Analysis PSM - Plasma Sampling Mass Spectrometer EQP SERIES - Analysis of Positive and Negative Ions, Neutrals and Radicals HPR-60 MBMS - for Ion and Radical Analysis at Atmospheric Pressure ESPion - Advanced Langmuir Probe for Plasma Diagnostics AutoSIMS IMP-EPD - End Point Detector for Ion Beam Etch XBS - Deposition Rate Monitor for Molecular Beam Analysis and Deposition Control TPD WORKSTATION - A System for UHV Temperature Programmed Desorption (TPD/TDS) Studies SECONDARY ION MASS SPECTROMETRY...

High Pressure Residual Gas Analyser Monitoring vacuum processes with a conventional RGA at pressures >10 -4 mbar typically requires the addition of differential pumping. Alternative analyser types optimised for high pressure operation have degraded sensitivity at low pressures. The innovative Hiden HMT analyser enables operation at high pressure yet maintains full RGA performance at high vacuum with dual mode operation: UHV mode for high performance residual gas analysis at pressure <10 -4 mbar through to 10 -13 mbar Profile mass scanning in RGA high sensitivity mode. High pressure mode for...

Process and Residual Gas Analysis The HPR-30 is a residual gas analyser configured for analysis of gases and vapours in vacuum processes and for vacuum diagnostics. The system is fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring. PRODUCTS RGA Series – residual gas analysers for vacuum measurement through to fundamental scientific research. DLS-1 with separation of He/D2, 3He/ HD/T and deuterated hydrocarbons (e.g. CxHy and CxDy) with mass range to 200 amu. HPR-30 Cart - with user adjustable...

Mass/Energy Analyser for Positive Ions, Neutrals and Radicals from Plasma The Hiden PSM plasma ion analyser is a quadrupole mass spectrometer designed for direct analysis of plasma ions, and neutrals in both plasma characterisation and process diagnostic applications. The PSM system includes ion extraction/exclusion optics with integral electron impact ioniser, triple filter mass analyser and an in-line energy analyser. The energy analyser enables ion energy distribution measurements for selected plasma ions. The ion extraction/exclusion optics serve to remove the background spectrum...

Mass/Energy Analyser for Ions, Neutrals and Radicals from Plasma The Hiden EQP Series quadrupole mass spectrometer systems are designed for direct analysis of plasma ion mass and energy in both plasma characterisation and process diagnostic applications. EQP systems measure both positive and negative ions. The integral electron bombardment ion source enables neutrals analysis and features an advanced appearance potential scanning routine. Additionally the Electron Attachment Ionisation mode is developed specifically for studies of electro-negative species. Ar+ ion energies. 6x10-2 mbar 20...

for Ion and Radical Analysis The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of reactive gas phase intermediates. Radicals are sampled via a multistage differentially pumped skimmer inlet and transferred to the MS ion source with minimal interaction with other species and without wall collisions. Customisable inlets allow connection to many different reactor systems, including atmospheric plasmas. The skimmer system, combined with a Hiden triple filter precision mass spectrometer, offers a sampling system with ultra fast response and high...

Advanced Langmuir Probe for Plasma Diagnostics ESPion Probe - in plasma ESPion Probes The ESPion Langmuir probe provides for measurement of the electrical properties of plasmas including: Plasma potential Floating potential Electron temperature Electron density Ion density Electron energy distribution Ion flux Routine monitoring of the I-V plasma characteristic by the Hiden ESPion probe gives direct information relating to plasma stability and reproducibility. Automatic real-time extrapolation of plasma parameters gives detailed information on plasma properties for use in characterisation...

End Point Detector for Ion Beam Etch The IMP-EPD is a differentially pumped, ruggedised secondary ion mass spectrometer for the analysis of secondary ions and neutrals from the ion beam etch process. The system includes integrated software with process specific algorithms developed for optimum process control. The IMP-EPD system is process proven for the production of high specification thin film devices for applications including magnetic thin films, high temperature superconductors and III-V semiconductors. Rising and falling edge algorithms Layer counting for End Point on a selected...

Deposition Rate Monitor for Molecular Beam Analysis & Deposition Control The Hiden XBS system is a quadrupole mass spectrometer designed for monitoring multiple beam sources simultaneously and uniquely offers beam acceptance through a 70° cone. Species-specific analogue signals are used for beam intensity output to the users’ source control modules. Beam acceptance apertures are configured individually for each specific process chamber source position, manufactured as replaceable plug-in elements to enable retrospective modification in event of chamber alteration. Purposedesigned with high...