Catalog excerpts
Mass Spectrometers for Residual Gas Analysis Applications (RGA)
Open the catalog to page 1MASS SPECTROMETERS for Residual Gas Analysis Applications (RGA) Residual gas analysers (RGA) provide a unique window into the vacuum environment for contamination monitoring, leak detection and analysis of the species of interest within the vacuum chamber, water vapour for example. The Hiden residual gas analysers are quadrupole mass spectrometers configured in a broad range of products to address applications in vacuum processing, science and technology. Hiden residual gas analysers are equipped with software that is intuitive and multi-level offering simple fail-safe* operation for a...
Open the catalog to page 2Contents RGA SERIES - Introduction HALO - for Residual Gas Analysis HAL/3F - Triple Filter Mass Spectrometer for Analytical Applications HAL/3F PIC - Triple Filter Mass Spectrometer with Pulse Ion Counting Detection for Fast Event Studies ION SOURCE OPTIONS HMT - High Pressure Residual Gas Analyser HAL - for Demanding UHV and XHV Applications HAL 101X - for Synchrotron/Accelerator and Tokamak/Torus Applications in Harsh Radiation Environments HALO 201 MBE - for Molecular Beam Epitaxy Applications XBS - Deposition Rate Monitor for Molecular Beam Analysis & Deposition Control 3F PIC SERIES -...
Open the catalog to page 3All Hiden residual gas analysers are application tested and calibrated to provide the highest quality performance, and they are backed by a 3 year warranty and lifetime service support. vacuum diagnostics molecular beam studies reactive sputtering closed loop control semiconductor production leak detection UHV/XHV surface science vacuum furnace monitoring vacuum process analysis contamination analysis THE HIDEN RGA SERIES INCLUDES THREE SPECIFICATION LEVELS: HALO - for residual gas analysis. HAL/3F - triple filter mass spectrometers for analytical applications. HAL/3F PIC - pulse ion...
Open the catalog to page 4for Residual Gas Analysis vacuum fingerprint: histogram & peak profile scan trend analysis: monitor multiple species > 80 partial pressure values in real-time leak detection zero blast and baseline drift are eliminated: compare and analyse vacuum chamber residual gas/vapour species Detector options: - Faraday-only, Faraday/Electron Multiplier Sensitivity with: - Faraday - detection to 1x10-11 mbar HALO 201 RC - Electron Multiplier - detection to 2x10-13 mbar Maximum Operating Pressure: - 1x10-4 mbar Helium in Air at 5 ppm - high sensitivity with stable background - even at high pressure 10...
Open the catalog to page 5Triple Filter Mass Spectrometer for Analytical Applications Mass Selective Primary Filter Post Filter Triple Filter Assembly. 3F Performance includes enhanced sensitivity for high mass species and increased resolution capabilities triple mass filter technology for high sensitivity with enhanced contamination resistance and abundance sensitivity application-specific ionisation sources for gas analysis, molecular beam measurement and UHV/XHV studies Mass range options: - 50, 200, 300 and 510 amu HAL/3F Analyser and RF Head - Series 1000 for mass range options up to 5000 amu Detection limit:...
Open the catalog to page 6Triple Filter Mass Spectrometer with Pulse Ion Counting Detection for Fast Event Studies Pulse ion counting detection for fast event studies including UHV TPD and for transient gas analysis 7 decade continuous measurement from 1 c/s to 107 c/s Multi-channel scaler detector option with time resolution to 50 nanoseconds Mass range options: - 50, 300 and 510 amu - Series 1000 for mass range options up to 5000 amu - etection limit with pulse ion counting detector D < 5x10-15 mbar Maximum operation pressure: - 5x10-6 mbar - 1x10 mbar with Faraday option -4 High quality transient data acquisition...
Open the catalog to page 7Hiden Analytical produces a wide variety of ion source types which can be fitted to our full range of RGAs. Ion source types are crucial to the performance of RGAs and having the ability to specify which source you require ensures our RGAs are custom configured for specific applications. ION SOURCE OPTIONS Standard RGA - A radially symmetric configuration for general applications. Standard and UHV low profile sources. UHV Low Profile - Optimised for UHV TPD studies enabling closer proximity of the ion source to the evolution surface. Closed Sources - For high pressure studies with direct...
Open the catalog to page 8High Pressure Residual Gas Analyser The Hiden HMT quadrupole mass spectrometer is a unique dual mode RGA system capable of operating at pressures up to 5x10-3 mbar without the need for differential pumping. Operation at this pressure is achieved using a specially designed ion source/quadrupole filter combination and software which corrects for abundance non-linearity. The unique high pressure specification makes the HMT ideal for process monitoring applications. The HMT can also operate in RGA mode in the same way as a traditional quadrupole RGA. Dual Faraday and electron multiplier...
Open the catalog to page 9for Demanding UHV and XHV Applications The Hiden RGA for UHV is designed and configured for residual gas analysis in demanding UHV applications where critical measurements at UHV are required. The HAL analyser can be configured either with a gold plated ion source for reduced ion source peaks from electron stimulated desorption (ESD) or with a vacuum fired UHV source for reduced hydrogen outgassing from the ion source. These specialised ion source configurations are ideally suited for applications where the total pressure is less than 5x10-10 mbar. Gold plated ion source. Vacuum fired ion...
Open the catalog to page 10for Synchrotron/Accelerator and Tokamak/Torus Applications in Harsh Radiation Environments Issues arise in situations involving very hard radiation environments due to the potential degradation of unprotected active electronic components, with protection typically requiring complex and bulky radiation shielding. The new and innovative Hiden HAL 101X RGA avoids all radiation shielding requirements by employing an original technique to completely eliminate use of active electronic components in the vicinity of the RGA vacuum gauge element. Control electronics can be located up to a full 80...
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