The Hiden ESPion Series Advanced Langmuir Probes for Plasma Diagnostics

The Hiden ESPion Series Advanced Langmuir Probes for Plasma Diagnostics The Hiden ESPion series are specialised tools for routine analysis of plasma characteristics, giving the user direct measurements for monitoring plasma stability and reproducibility. Hiden’s ESPionSoft software package enables the user to automatically determine a wide variety of plasma parameters in real-time. Systems can be configured with a range of customisable options to interface with a wide variety of plasma system arrangements. For example, customised insertion length, z-motion drives, flexible and articulated probes...

ESPion Series Probe Layout ESPion Series Probe Configuration Probe Connector Compensation Electrode Reference Electrode Reference electrode Probe Body Probe body (ceramic) Probe Tip User replaceable probe tips are also available in different geometries to suit different plasma applications including:  Cylindrical  90° for magnetically confined plasmas and plasma mapping More than 20 tip materials are available, including Tungsten, Platinum, Molybdenum and Tantalum. Tips can be automatically cleaned between scans with softwarecontrolled cleaning regimes. Probe Bias (V) Current (A)  Planar for...

Reference Electrode Z-Motion Drives The integrated low frequency reference electrode provides an internally referenced voltage to compensate for low frequency interference effects. Examples include, shift in plasma potential due to deposition on chamber walls and external power supply noise. A range of bellows-sealed, stepper motor driven ‘z’-drives allowing spatially resolved measurements are available. Probe movement is fully software controlled enabling a suite of measurements to be pre-set to define linear motion rate, probe position and measurement period. Manual versions are also available....

ESPionSoft Software Package The Hiden ESPionSoft software package allows expert and non-expert users to carry out manual, semi-automatic and fully automatic analyses. The user-friendly interface has the following key features:  Specific plasma probe data functions for the extraction of plasma parameters.  Multiple graph displays and multiple files open simultaneously.  Standard math operations on data curves (add, average, smooth, differentiate). The Acquisition Wizard allows the specific scan parameters to be set, such as the scanned probe voltage, -200 V to +100 V, minimum increment 25 mV...

Example Data Data Analysis Analysis of plasma parameters can be either fully or semi-automated. Analysis is presented as a report or analysis of individual parameters. Raw data can also be exported in a number of formats for manipulation with external programs such as MS Excel, Origin etc. Electron Energy Distribution Function, EEDF EEDF is determined by the Druyvestyn method, using the second derivative of electron current with respect to voltage from the IV curve attained, the ESPionSoft software also provides additional measurements for Te, Ne and EE. The I-V Curve Data is presented as an...

Example Data System Configuration & Options Data Filtering and Smoothing The ESPion system can be configured with a wide range of customised options to suit many plasma conditions. The ESPionSoft software package is equipped with a Savitzky-Golay filter which allows the data to be digitally smoothed, improving the signal to noise ratio with minimal distortion. The end user can choose the system options to meet specific application requirements. Option ESPion RF/DC complete static probe system 316.5 mm ESPion DC/HT complete static probe system 316.5 mm 600 mm automatic bellows-sealed linear motion...

Hiden’s quadrupole mass spectrometer systems address a broad application range in: GAS ANALYSIS dynamic measurement of reaction gas streams catalysis and thermal analysis molecular beam studies dissolved species probes fermentation, environmental and ecological studies SURFACE ANALYSIS UHV TPD SIMS end point detection in ion beam etch elemental imaging – 3D mapping PLASMA DIAGNOSTICS plasma source characterisation etch and deposition process reaction kinetic studies analysis of neutral and radical species VACUUM ANALYSIS partial pressure measurement and control of process gases reactive sputter...