EQP Series Sensitivity Mass and Energy Analysers for Monitoring, High Control and Characterisation of Ions, Neutrals and Radicals in Plasma

The Hiden EQP Series - Mass and Energy Analysers for Plasma Diagnostics and Characterisation Plasma Sampling Interface XXPlasma is sampled via a laser drilled orifice available from 30 – 300 µm. XXThe orifice is specifically designed for plasma sampling, using pre-thinned material for the laser drilled component. XXThe ion extraction optics are software controlled and optimised for minimum plasma perturbation. XXThe optics are fully tuneable for optimum detection of +ve and –ve ions as well as electrons and radicals. EQP PLASMA SAMPLING INTERFACE Internal Ioniser Integral Ionisation Source XXThe...

EQP ABUNDANCE SENSITIVITY Typical Ar+ and ArH+ mass resolved spectrum Triple filter quadrupole mass analyser EQP SENSITIVITY - 20 ppb detection of C+ ions from CF4 plasma Ion flight tube to provide plasma sampling insertion from 240 mm up to 750 mm 45˚ Sector field energy analyser Turbo molecular pump port XXA digital ion counting detector is included as standard with 7-decade continuous dynamic range. Counting is via a 32-bit counter for 1 c/s resolution. Mass Analyser XXA Hiden high performance triple filter0mass spectrometer 44 35 36 37 38 36 40 41 42 43 mass : amu is included with the EQP...

Hiden EQP Plasma diagnostics Systems The Hiden EQP System is an advanced plasma diagnostic tool with combined high transmission ion energy analyser and quadrupole mass spectrometer, acquiring both mass spectra at specified ion energies ioniser provides for neutral and radical detection, the electron Ar+ IED Inductively Coupled Plasma Source 3x10-2 mbar 100W and ion energy distributions of selected plasma ions. The advanced EQP attachment ionisation feature further enhancing the detection capability for radicals in electronegative plasma chemistries. XXIon Energy Analysis Ion Energy distributions...

Ion Energy Distributions in dual frequency RF Plasmas Ion energy distributions (IEDs) for both positive and negative ions have been measured, using a mass/energy spectrometer system, for two plasma reactors which can be operated using a combination of two RF power sources. One reactor uses capacitively-coupled inputs and the other includes an inductivelycoupled input. Typical data for 2.26, 13.56 and 27.1 MHz inputs are presented for a range of phase relationships. The IEDs clearly show significant differences between the data for different species of ions. The differences result, in part, from...

EXAMPLE EQP DATA DATA EXAMPLE EQP Plasma etching of Hf-based highHf-based high k thin films Plasma etching of k thin films 3 mTorr, 500Watt QMS-measured plasma ionic species are shown in QMS-measured plasma ionic species are shown in (a) and (b). Higher(a) andionic Higher mass ionic species measured by mass (b). species measured by QMS are shown inQMS are(d). The in (c) in the leftThe data in the left (c) and shown data and (d). column are taken at 3 mTorr and 500W3 mTorr and 500W (high density column are taken at (high density plasma condition) plasma condition) right columnin the right column...

System Options The EQP system can be configured with a wide range of customised options to suit many plasma conditions. These include: Option Dual Faraday/ Electron Multiplier Detector Extended Flight Tube 321 or 400 mm Extended Flight Tube to 750 mm Magnetic Shielding to 800 Gauss Magnetic Shielding to 500 Gauss Electron Attachment Ionisation DC Driven Electrode 44 mm diameter RF/DC Driven Electrode 150 mm diameter Water Cooled RF/DC Electrode 84 mm diameter Z-drive 4” Stroke – Manual Z-drive 12” Stroke – Motorised RIV60 Re-Entrant Isolation Valve PC Computer with MASsoft Professional Software...

Hiden’s quadrupole mass spectrometer systems address a broad application range in: GAS ANALYSIS dynamic measurement of reaction gas streams catalysis and thermal analysis molecular beam studies dissolved species probes fermentation, environmental and ecological studies SURFACE ANALYSIS UHV TPD SIMS end point detection in ion beam etch elemental imaging – 3D mapping PLASMA DIAGNOSTICS plasma source characterisation etch and deposition process reaction kinetic studies analysis of neutral and radical species VACUUM ANALYSIS partial pressure measurement and control of process gases reactive sputter...