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Optical Gauge series
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Optical Gauge series Optical NanoGauge Thickness measurement system Optical MicroGauge Thickness measurement system

Optical Gauge Line-up and benefit Roll-to-roll film production Example applications Measurement principle: Both surface analysis Optical NanoGauge Thickness measurement system Optical NanoGauge Thickness measurement system Multipoint NanoGauge Thickness measurement system Our lineup includes the Optical NanoGauge 18 Optical Gauge series Optical NanoGauge Thickness measurement system C13027 Supported Optical MicroGauge Thickness measurement system C11011 Supported Optional products measurement, models for microscopic ranges, and other equipment to satisfy the diverse films to measuring the...

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Optical Gauge Line-up Optical NanoGauge C13027 Ultrathin film measurement with high speed Multipoint measurement Extensibility type for research laboratory Glass Glass Glass Glass Microscope type NanoGauge Embedded type in 1Box unit Sample thickness Optical MicroGauge * The refractive indices in this catalog are 1.5 for glass and 3.67 for silicon. Thick film measurement with high speed Optical Gauge series excels at defocus and angular dependence. The series offers the following benefits when installed. Focus dependence versus reference point: ±3 mm (1 mm pitch), WD of reference point: 10...

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Roll-to-roll film production In-line measurement for vacuum deposition equipment In-line measurement for coating equipment Multipoint NanoGauge Thickness measurement system C11295 Optical NanoGauge Thickness measurement system C12562/C13027 Multipoint NanoGauge Thickness measurement system C11295 Optical MicroGauge Thickness measurement system C11011 Reflectivity measurement Transmission measurement Film thickness measurement Evaporation film (PVD/CVD) Coating layer Vacuum chamber Cutting, Roll-up Plastic film, Bonding layer, ITO, Wet film Drying, Curing Let-off Coating, Deposition...

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Measurement principle Spectral interferometry is used to measure film thickness. When light enters a thin film sample, multiple reflections occur inside the thin film. These multiple-reflection light waves boost or weaken each other along with their phase difference. The phase difference of each multiple-reflection light is determined by the light wavelength and optical path length (= distance that light moves back and forth in the thin film multiplied by the film refractive index). This phase difference allows the spectrum reflected from or transmitted through the sample to produce a...

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Both surface analysis The analysis is performed using the film thickness measurement software for both surface U12708-01. (Patented) Both surface analysis for both-side-coated samples In some cases, a coating film is applied to the back side of thin film samples. If such both-side-coated samples are measured by an ordinary method, the fitting cannot be consistent as the effect of the film on the back side is not taken into account, and therefore accurate values cannot be obtained. In addition, if the thickness of the film on the back side changes, the system cannot follow the change during...

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Optical NanoGauge Thickness measurement system This model supports connections to a PLC and easily installs in production equipment Ultrathin film measurement with high speed Measurable range The Optical NanoGauge Thickness measurement system C13027 is a non-contact film thickness measurement system utilizing spectral interferometry. The C13027 not only supports PLC connections but is also designed more compact than our other models for easy installation into equipment. Our Optical Gauge series is capable of measuring the thickness of extremely thin films down to 10 nm as well as covering a...

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Configuration example C13027 Example of system configuration (off-line) Standard Option C13027 Example of system configuration (in-line) Optical NanoGauge Thickness measurement system C13027 Data analyzer Standard Option Film thickness measurement software Film thickness measurement software Sample stage Optical NanoGauge Thickness measurement system C13027 Manufacturing equipment (i.e., etching or film forming equipment) Data analysis module M11698 Option Sample stage for Optical NanoGauge A10192-10 Mapping stage Φ200 mm C8126-31 Mapping stage Φ300 mm C8126-32 This stage accommodates...

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Optical NanoGauge Thickness measurement system C12562 An integrated type designed for installation into equipment and ideal for measuring a wide diverse range of objects from thin films to substrates and more Embedded type in 1Box unit The Optical NanoGauge Thickness measurement system C12562 is a compact, space-saving, non-contact film thickness measurement system designed to easily install in equipment where needed. In the semiconductor industry, measuring silicon thickness is essential due to the spread of through-silicon via technology; and in the film production industry, adhesion...

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Configuration example C12562 Example of system configuration (In-line) C12562 Example of system configuration (Off-line) Optical NanoGauge Thickness measurement system C12562 Standard Option Standard Option Data analyzer Film thickness measurement software Film thickness measurement software Sample stage Manufacturing equipment (i.e., etching or film forming equipment) Data analysis module M11698 Optical NanoGauge Thickness measurement system C12562 Option Sample stage for Optical NanoGauge A10192-10 Macro optics FC connector type for VIS A10191-03 Visible light condenser lens for A10192-05...

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Optical NanoGauge Thickness measurement system C10178 Versatile standard type for basic research Extensibility type for research laboratory The Optical NanoGauge Thickness measurement system C10178 is a non-contact film thickness measurement system utilizing spectral interferometry. Film thickness is measured quickly with high sensitivity and high accuracy through spectral interferometry. Our products use a multichannel spectrometer PMA as detectors, which allows for measurement of quantum yields, reflection, transmission/absorption, and a various other points while simultaneously measuring...

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