
Committed to becoming a world-class supplier of vacuum surface treatment solutions Striving to reduce industrial energy consumption
Open the catalog to page 1Equipment Process
Open the catalog to page 2Equipment Introduction-GFOUR GFOUR introduces a new four-target solution, featuring high-power, tunable square-wave plasma technology with precise ionization control. This enables both thin and thick coatings, delivering excellent adhesion and consistently smooth, droplet-free surfaces High adhesion strength Tunable coating density Smooth coating without droplets Flexible coating targets
Open the catalog to page 4Equipment Features-GFOUR GFOUR coating integrates the best of both worlds — the high density of arc deposition and the low-stress, droplet-free performance of magnetron sputtering Ultra-thick coating for greater than 50% longer life
Open the catalog to page 6Equipment Technical Features-GFOUR Tunable — freely combine columnar and dense crystals G4PLUSdensity 涂层,同时具备电弧高致密性,及磁控低应力、无液滴的技术优点 Smoothness Droplet-free, dense crystals Droplet free Columnar Bold columnar crystals Delicate columnar crystals
Open the catalog to page 7Thickness: tunable from 0.5 to 30 ^m, maintaining consistently smooth performance. Smoothness Cross-sectional SEM Surface
Open the catalog to page 8Equipment Technical Features-GFOUR Edge rounding: tunable from as low as 3 μm while maintaining edge integrity and protection Smoothness Droplet free Droplet free Cutting Edge Rake Face Flank Face Rake Face Flank Face Rake Face Flank Face Rake Face Flank Face Edge radius/um
Open the catalog to page 9Equipment Technical Features-GFOUR A fully tunable coating technology, enabling tailor-made process development. Tunable Discharge Pulse Tunable ionization rate plasma ionization rate Integrated Cathode Flexible stress and thickness More stable waveform Traditional HiPIMS More stable Plasma 0.1 Traditional HiPIMS current waveform Target current/A Huasheng GFOUR Integrated Cathode Discharge Waveform Diagram
Open the catalog to page 10Equipment Technical Features-GFOUR GFOUR proprietary magnetic field design: l Minimizes ion back-flow near the target l Boosts sputtering efficiency and deposition speed l Expands the erosion area for better target usage GFOUR magnetic field design Sputtering area becomes wider T a r g e 溅 t 射 区 G4PLUS 域 磁 变 场 宽 Sheath voltage - magnetic field st
Open the catalog to page 11Equipment Technical Features-GFOUR Excellent coating adhesion Coating Substrate Good adhesion Good adhesion GFOUR coating
Open the catalog to page 12Equipment Technical Features-GFOUR No droplets, smoother surface
Open the catalog to page 13Equipment Technical Features-GFOUR Low stress. Strong edge integrity
Open the catalog to page 14Excellent coating conformality with uniform and precisely controllable thickness Rake Face
Open the catalog to page 15Loading Area
Open the catalog to page 17Coating Technology 4th generation hybrid coating technology Chamber volume(m³) Effective Coating Area(mm) Spindle diameter(mm
Open the catalog to page 18Equipment Layout Vacuum extraction module
Open the catalog to page 20Equipment Parameters Model
Open the catalog to page 21GFOUR system consumption Model Minimum purity (N2) 50L per batch (H2) 10L per batch Standard nitrogen(N2) 70L per batch Cooling water Maximum heat dissipation100kW Flow rate150 L/min (Consumption:10 L per batch) Power consumption
Open the catalog to page 22System components Workpiece holder base Heating Module Etching module Main Unit Cathode Module Cooling Water Module
Open the catalog to page 23The vacuum chamber is pumped down to the required coating pressure Vacuum System Operators can select either pressure control mode or flow control mode Precise gas control is achievable for optimal coating performance Provides cooling water to each functional module Cooling Water System Protects components and module seals during hightemperature operation Independent flow and temperature monitoring per branch.
Open the catalog to page 24Ion source control system Heater temperature measurement system Radiant heating of the workpiece holder and products e n a b l e s t h o r o u g h b a ke - o u t o f m o i s t u r e a n d i n te r n a l ga s e s , w i t h p r e c i s e c h a m b e r te m p e ra t u r e c o n t r o l fo r u n i fo r m h e a t i n g
Open the catalog to page 25Integrated cathode Drive system and rotating platform Magnetic fluid-sealed main shaft G e a r - d r i ve n p l a t fo r m : d i s k r e vo l u t i o n + i n d i v i d u a l h o l d e r rotation
Open the catalog to page 26• Compared with DC sputtering, the integrated cathode provides higher ionization and more active plasma • Square-wave mode allows faster deposition and superior coating quality. • Constant-current output ensures stable ionization rates Item Parameters Voltage range Power Duty cycle range
Open the catalog to page 27Bias Power Supply (Hüttinger) l Constant-voltage output provides a negative bias to the workpiece holder l During etching, argon ions are accelerated to bombard the workpiece surface l Ensures more thorough workpiece cleaning, enhancing coating adhesion l Coating properties can be adjusted by varying the negative bias Voltage range Duty Cycel Range
Open the catalog to page 28List of core components No.
Open the catalog to page 29List of core components No.
Open the catalog to page 30Brands of the Main ComponentsComponent Molecular pump Backing pump Cathode power supply Bias power supply Flow meter Vaccum Gauge Automation System Main Electronic Components
Open the catalog to page 31Optional Accessories *图片供参考,以实际下单需求为准 Pictures for reference only,subject to th
Open the catalog to page 32HuangSheng®GFOUR Coating Process ListGFOUR Recommended Coating Process List Process
Open the catalog to page 34GFOUR®U1 SeriesApplication Case 1: Heavy Milling Insert: APMT1604 Test Conditions: 0 Machining Method: Rough Milling Test Results: 0 Passed, Significantly Better than LM Data Source: • Tool Manufacturer Inspection Item
Open the catalog to page 35GFOUR®U1 Series Application Case 2:Turning of Train Wheel Hubs Insert:Turning of Train Wheel Hubs Workpiece: Ø Alloy Steel Test Conditions: Ø Machining Method: Continuous External Turning Test Results: Ø Passed, Ø Achieves CVD Performance Comparable to Ion bond Data Source: • Tool Manufacturer Confidential Inspection Item Tool Passivation Value (μm)
Open the catalog to page 36GFOUR®U1 SeriesApplication Case 3: Insert: Gear Milling Insert DE901 Test Conditions: 0 Machining Method: Gear Milling Test Results: 0 Passed, 40% Better than DR Coating Data Source: • Tool Manufacturer Inspection Item
Open the catalog to page 37Stainless Steel Turning Stainless Steel Milling Confidential
Open the catalog to page 38GFOUR®U1Pro • Application Case 4:Stainless Steel Milling Tool Life/Min 80 Test Conditions:Face Milling • Cutting Speed:Vc = 160m/min • Feed per Tooth:Fz = 0.5mm/z • Depth of Cut:ap = 0.2mm • Width of Cut:ae = 12.75mm • Cooling Method:Air Cooling Test Results: • Tool Life Criteria: Flank Wear (Vb): > 0.3 mm • Result: GFOUR-U1Pro coating achieves 76% longer cutting life than SS330 coating Workpiece: • 304 Stainless Steel (150-180HB) Data Source:Huasheng Cuttin
Open the catalog to page 3922 Pages
38 Pages