FUJI ULTRASONIC Semiconductor Production Process Fuji Ultrasonic Engineering Co., Ltd.

LTRASOIMIC CONI Binary Type ■Concentration measurements of CMP Slurry or H2O2 in CMP Slurry. ■Concentration measurements of cleaning solutions. ■ Concentration measurements on dilution systems. (HF • NHa • HaQa ■ BHF • KOH • HzSO* • HCI • HNOa ■ TMAH etc.) ■ Concentration measurements on etching processes. ■ By exchanging calibration curves, it can be measured for various kinds of liquids. ■ Good for concentration measurements at use-points. ■ Direct attachment to lines is available because of compact and light Cell-Type transducer. ■ Maintenance Free design. ■ The contact area to the liquid...

NITRATION METE Ternary Type Graph of TMAH + Resist ■ Concentration measurements on CMP processes. ■ Concentration measurements on cleaning processes. ■ Concentration measurements on developing or etching processes. ■ Concentration measurements on stripping processes. ■ Direct attachment to lines is available because of compact and light Cell-Type transducer. ■ Maintenance Free design. ■ No influence to chemical formations because of the design for small ultrasonic propagations. ■Real-time continuous measurements. cloanlng equipment chemical concentration control example for EL grade Adaptable...

Submerged Type Piezo Element Temp. Sensor Sensor Type Fitting Material Fitting (inch) Flow ^^^^ Submerged Type Flow Cell Type PFA/PFA Coated Flow Ceil Type Plezo Element Temp. Sensor Sensor Type Fitting Material Fitting (inch) SA-20S7 ■ Conductlvltyifor CMP) | AP-30S12 + Conductivity (for SC-1) I SA-20S9*Conductlvlty(for Chomicals) Flow Cell Type PFA/PFA Coated Flow Cell Type Fuji Ultrasonic Engineering Co., Ltd. W 1068 IfcJa-cho, Hamamatsu-ary, Shizuoka, 435-0028 ^UEL-^ Sales Dept. • The specifications or designs may be changed without notice.