PARTICULATE MEASUREMENT SYSTEM envea High-performance particulate monitoring system designed for industrial stack applications where dust levels are typically above 10 mg/m3. ■ Extensively used for compliance measurement (mg/m3) in the Power, Steel and Cement industries ■ Advanced sensor design includes zero, span and unique contamination checks ■ Lens can be accessed and cleaned without the need for disconnecting the flanges from the stack, ensuring correct alignment even after maintenance intervals ■ Dynamic-Opacity® Ratiometric Opacity technology with both dust concentration (mg/m3) and Opacity outputs ■ Rugged operation with dust concentration measurement unaffected by lens contamination of 90%

STACK 602 PARTICULATE MEASUREMENT SYSTEM SYSTEM DESCRIPTION Using advanced optical measurement (DynamicOpacity® Ratiometric Opacity technology), the STACK 602 delivers reliable, real-time dust concentration measurements across a wide range of process conditions, helping operators maintain environmental compliance while optimising plant performance. This proven optical technique, coupled with advanced design features, offers significant reliability and resolution advantages over traditional Opacity monitors andvirtually overcomes lens fouling associated with standard Opacity monitors. TECHNICAL...