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DM_170_Light_Scatter_Particulate_Emission_Monitor_PCME ENVEA

DM_170_Light_Scatter_Particulate_Emission_Monitor_PCME ENVEA
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DM_170_Light_Scatter_Particulate_Emission_Monitor_PCME ENVEA - 1

Light Scatter Particulate Emission Monitor PROCESS & EMISSIONS MONITORING SYSTEMS Part of ENVEA’s family of Backscatter particulate measurement sensors, the DM 170 is designed to comply with the TUV suitability testing scheme to EN 15267 and for measuring dust concentrations in a wide range of industrial applications. Due to its wide dynamic range, the DM 170 may be used in Combustion applications as well as in higher dust loading applications (such as Power, Cement and Metals smelting, and in processes without filtration). Its simplicity and wide operating range makes it also ideally suited for process optimisation applications. KEY FEATURES: ProScatter ® Backscatter sensor technology with superior minimum detection level as low as 1 mg/m3³ compared to conventional techniques Manual and remote Zero and Span (Reference) checks available to ensure optimal instrument performance DM 170 shown with Manual Audit Unit Telescope Field-of-View Contamination risks are further reduced due to singleside stack installation where critical optical components remain outside the stack A Flue Gas Blocker can be fitted to ensure that flue gases do not escape when the unit is opened (for auditing/maintenance purposes), thus enhancing on-site personnel safety Offers a more reliable PM dust measurement as an alternative to Opacity and Scintillation based monitors for emissions that are reported in mg/m³ and provides early indication of increased dust emissions in processes with low dust concentrations Sensor-to-Stack Connection Outgoing Laser Beam Purge Flow Fail Sensor and Optical Shield options Non-intrusive system designed to operate in noncondensing stack environments and to reduce the risk of contamination The DM 170 is well-suited for use in medium to large stacks and is suitable for low to high dust concentration measurements, regardless of dust velocity or charge. Typical applications include: Continuous Emission Monitoring (CEM) relative to Emission Limit Values (ELV) in Power Plant, Boiler and Metal Smelting applications Filter performance monitoring in Metal, Mineral and Chemica

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DM_170_Light_Scatter_Particulate_Emission_Monitor_PCME ENVEA - 2

PRINCIPLE OF OPERATION: The DM 170 is based on ENVEA's class-leading ProScatter® Backscatter technology. Particles in the stack are illuminated by a laser and the amount of laser-light scattered back from the particles is measured by a detector. Stray scattering and ambient light are eliminated by tuning the instrument's field-of-view and by use of a modulated laser source. The instrument response is proportional to dust concentration. It can be calibrated to provide a mg/m3 measurement by comparison to results of a standard reference (isokinetic) test. With the ability to measure dust...

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