Parallel Kinematic Piezoelectric Stage Highlights of the PKA Stage Design The PKA-ZPR-200 nanopositioning stage was developed for active alignment correction. It uses a parallel kinematic architecture for high stiffness and high resonant frequency with one translational degree of freedom and two rotational degrees of freedom. It features flexure-guided motion over a nominal 200 um displacement range. Rotational range of motion is greater than 4 mrad. The stage’s stable and stiff kinematic design promotes dynamic responsiveness for excellent position stability and control. It is designed to include high-resolution metrology that, when combined with a suitable 3 channel low-noise piezoelectric amplifier, can deliver position resolution of 10 nm or better. • Flexure-guided for smooth, parallel motion • Option for integrated metrology • High natural frequencies and rapid response • Linear displacement range of 200 µm • Angular displacement > 4 milliradians • Customizable and scalable for new applications • Open-Loop Travel: • Closed-Loop Resolution: • Unloaded Resonant Freq: • Resonant Freq with 500 g: 200 micron linear in Z > 4 mrad rotary X & Y metrology dependent – 10 nanometers typical with capacitive probe >590 Hz >280 Hz Applications Parallel kinematic mechanisms are recommended for applications where high natural frequency and stiffness are needed with multiple degrees of freedom. Control of parallel kinematics is more complicated than stacked serial stages, so parallel kinematic designs are generally reserved for high performance systems. • Electrical Capacitance: • Operating Temp Range: • Dimensions: • Material: • Ultra-High Vacuum Compatible 8 µF per channel 25 to 50 degrees Celsius 72 mm diameter by 44 mm tall Stainless steel or titanium The ZPR-200 translation is aligned with the Z-axis (blue arrow) with simultaneous rotation about the two orthogonal axes Due to parallel kinematics, the peak displacement and peak rotation can not be achieved simultaneously. The range of motion is a function of the displacement and rotations combined.