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LITHOGUARD®

LITHOGUARD®
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CHEMICAL CONTAMINATION CONTROL Semiconductor Filtration chemical filter is a high efficiency filtration system that removes gas-phase contaminants such as volatile bases, acid gases, condensable organics, as well as particles. Designed for high end lithography tools, including tools, it provides an ultra-clean environment that enables critical chemical processes and prevents the degradation and contamination of optical elements. FEATURES & BENEFITS • Small footprint • High efficiency filtration (each individual filter achieving 99%+ removal efficiency) • Serial filtration that enables air sampling between • Long filter life • Donaldson Refill Program • HEPA Particulate filtration > 99.97% efficiency • No facility requirements. No connection to CDA Supply Utility Requirements • The LITHOGUARD-12 requires: • No electrical supply required • 12 - Donaldson BSMmax chemical filters AND • No compressed air supply required • 6 - Donaldson HEPA particulate filters • Real-time air sampling via integrated sampling ports allows for continuous performance management. • Using the latest airflow modeling technology, the LITHOGUARD-12 was designed to: • Utilize a small footprint • Optimize filtration performance • Ensure even distribution of airflow through each filter element • Maximize system efficiency and life

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Contact Donaldson today for more information! Hong Kong/China Lithoguard-12 Chemical Contamination Control (01/11) © 2009 Donaldson Company. All Rights Reserved. Information in this document is subject to change without notice.

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