INFINITY ION BEAM SPUTTERING SOLUTION TECHNICAL SPECIFICATION SHEET Patented ion beam sputtering technology provides higher performance than traditional thin film deposition technologies. BENEFITS INCLUDE: • Wide range of process pressures • Control of adatom energies • Excellent uniformity and repeatability • Low defect and low contamination • Atomically engineered thin film interfaces and surfaces • Able to accommodate multiple substrate sizes up to 8" Extreme thickness uniformity Dense, defect free films Large mean free path Collimation Dense films Compatible with front-end options Easily scalable to meet throughput demands Automation software Enhanced process control Short MTTR/Long MTBF High system uptime and ease of maintenance 1259 North Church Street, Bldg 3, Moorestown, NJ USA 08057 | 1-800-666-6004 [email protected] | www.dentonv

SYSTEM OVERVIEW The Denton Infinity Ion Beam Deposition System employs an energetic beam of inert gas ions harnessed from an RF ion source to bombard a target material. The resulting sputter plume is deposited on a rotating fixture. Thin films created through ion beam sputtering are of a high quality and have very precise thickness due to the monoenergetic ion beam used. This process is often used to create coatings for precision optics and semiconductors, where the utmost precision is required. The major components of the Denton Infinity IBD System are the cassette elevator and the processing...