INFINITY FA SYSTEM Denton Vacuum Infinity FA System is a cost-effective solution for etching and profiling devices with high throughput, providing rapid results at a low cost of ownership. The fully integrated SIMS package provides the precision required to locate small defects for further analysis. BENEFITS INCLUDE: • Large etch area • Delayering capability for all typical semiconductor device materials • Pristine sample surface for high resolution imaging • Uniform layer removal regardless of chemical composition • Precision endpoint control • Able to accommodate multiple substrate sizes up to 6" Uniform delayering over a large area Minimal damage to the surface Variable Ion Incidence Angle Etch rate normalization for different materials Secondary Ion Mass Spectrometer (SIMS) High precision endpoint control Automation Software Enhanced process control 1259 North Church Street, Bldg 3, Moorestown, NJ USA 08057 | 1-800-666-6004 [email protected] | www.dentonv

SYSTEM OVERVIEW The Infinity FA System is a high-performance etching tool designed for failure analysis sample preparation, critical thin film profiling and delayering in semiconductor manufacturing. Ion beam etch (IBE), reactive ion beam etch (RIBE), and chemically assisted ion beam etch (CAIBE) can be utilized to provide uniform etch rates for multi-material layers. The system includes a robust secondary ion mass spectrometer (SIMS) package for analyzing thin film removal. It is ESD compliant and is fully computer controlled for high automation and repeatability. SIMS enables precision endpoint...