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Tropel® UltraFlat™ Photomask Form Analysis System

Tropel® UltraFlat™ Photomask Form Analysis System
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Tropel® UltraFlat™ Photomask Form Analysis System - 1

The Tropel® UltraFlat™ 200 Mask System provides unprecedented flatness measurements of photomasks. Manual handling, fully automated robotic handling, and Class 1 clean room environment options are available. The Tropel® UltraFlat™200 Mask System, manufactured by Corning Tropel Corporation, is designed specifically for the photomask industry. Its low measurement uncertainty makes the UltraFlat System the perfect tool for today’s ever-tightening mask flatness specifications. The push for smaller device features requires that photomasks be extremely flat. The UltraFlat System is used to measure flatness ofphotoblanks and photomasks throughout every stage of the manufacturing process, including, polishing, coating, patterning, pellicle mounting and analyzing the effects film stress. The UltraFlat system utilizes nearnormal incidence interferometry, rock solid structural design, state-of-the-art optics and Corning Tropel's renowned phase shifting analysis software; delivering up to 6 nm measurement uncertainty. The system is NIST traceable and provides measurements that conform to SEMI standards. An automated photomask handling and measurement configuration and clean room option are also available.

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Tropel® UltraFlat™ Photomask Form Analysis System - 2

Measurement method Near Normal-Incidence Interferometry 6 nanometers 10 micrometers < 6 inches (6025, 5009 and other available upon request) < 1,000,000 per measurement < 30 seconds Front referenced flatness, local slope, stress, microwaviness, x-y polyfit 3-D, contour, isometric, histogram and site plots, site analysis Performance Uncertainty1 Dynamic range2 Mask sizes Measured data points Measurement time Standard measurements Data analysis Data Management Data storage 80 Gb hard drive Operating system Windows XP Interferometer housing and base 89 cm x 117 cm x 132 cm (35 in x...

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