LAB family Systems and References
12Pages

Systems and References SPECIAL SYSTEMS Lab Family

• T1600/TRIVAC D65 B + WSU 501 • gate valve DN 250 • PLC with touch screen terminal • 3 x 4” cathode with reactive gas shower • RF-plasma ion source • rotary substrate heater table up to 600°C • multilayer deposition • co-sputtering • ion beam etching SPECIAL SYSTEMS Lab 600 SP Sputter Coater

• Ecodry 50 LR + WSU 501 / COOLVAC 2500 • gate valve DN 250 • 2 x e-gun ESV14 • 2 x e-gun controller EGC 38 • deposition controller IC/5 • 4 x crystal with shutter • LAB plus control system • End hall ion source with hollow cathode neutralizer SPECIAL SYSTEMS Lab 600 SP Evaporation System

• Ecodry 50 LR + WSU 501 / COOLVAC 2500 • gate valve DN 250 • 2 x e-gun ESV14 • 2 x e-gun controller EGC 38 • deposition controller IC/5 • 4 x crystal with shutter • LAB plus control system • End hall ion source with hollow cathode neutralizer SPECIAL SYSTEMS Lab 600 H Evaporation System

• Short coating cycle time due to use of cryogenic pumping system • Planetary substrate holder for uniform coating of 3D parts • Increased substrate capacity due to use special rotation scheme • The system can be equipped with thermal evaporators or magnetrons • Two doors for installation of process equipment available • Linear glow discharge for plasma cleaning and pre-treatment of substrates SPECIAL SYSTEMS Lab 600 H Evaporation System

• COOLVAC 3.011 with ECODRY / WSU 251 • 2 x e-gun ESV 14/4 • 2 x e-gun controller EGC 38 • ECWR plasma source Cobra • 2 x thermal evaporator • UHV rotary substrate drive • 3 x 19”cabinet with all integrated devices • deposition controller IC5 • LAB plus control system Lab 700 SPECIAL SYSTEMS Evaporation System

• DIP12000 with TRIVAC D65B / RUVACWSU501 • 2 x e-gun ESV14/4 • 2 x e-gun controller EGC 38 • 3 x thermal evaporator • deposition controller IC/5 • OMS3000 with test glass changer • 2 x quartz lamp heater • UHV rotary feedthrough with hollow shaft and substrate palette • LAB plus control system SPECIAL SYSTEMS Lab 900 EB Evaporation System

• DIP1200 • SOGEVAC SV 300 / WSU 1001 • 2 x e-gun ESV 14/4 • 2 x e-gun controller EGC 38 • 2 x thermal evaporator • 1 x End hall ion source with filament neutralizer • 1 x deposition controller IC/5 • 2 x ceramic heater 5,2 kW • LAB plus control system Lab 1100 SPECIAL SYSTEMS Evaporation System

• COOLVAC 10000 CL • ECODRY LR 50 + Roots WSU 501 • Chamber heating system • 6 x single pocket e-beam evaporator • 4 x deposition controller XTC/2 • 1 x ECWR plasma source • 1 x 16 cm Kaufman ion source • LAB plus control system SPECIAL SYSTEMS Lab 1100 UHV Evaporation System

• DIP 20000 • screwline SP 630 + Roots WAU 2001 • 4 x high volume thermal evaporator • 4 x deposition controller XTM/2 • 4 x rotary substrate drive Lab 1820 SPECIAL SYSTEMS Evaporation System

• COOLVAC 3.011 with ECODRY / WSU 251 • 2 x e-gun ESV 14/4 • 2 x e-gun controller EGC 38 • ECWR plasma source Cobra • 2 x thermal evaporator • UHV rotary substrate drive • 3 x 19”cabinet with all integrated devices • deposition controller IC5 • LAB plus control system BAK 760 SPECIAL SYSTEMS Retrofit

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