GF100 Series
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DATA SHEET Thermal Mass Flow High Purity/Ultra-High Purity Digital Mass Flow Devices GF100 Series Designed for semiconductor, MOCVD, and other gas flow control applications that require a high purity all-metal flow path, the Brooks® GF100 Series mass flow controllers and meters deliver outstanding performance, reliability, and flexibility. Highlights of the GF Series industry-leading features include: ultra fast 300 millisecond settling time, MultiFlo™ gas and range programmability, optional pressure transient insensitivity (PTI), local display, extremely low wetted surface area, and corrosion resistant Hastelloy® sensor tube and valve seat. The GF100 Series has been marathon tested to over three times the semiconductor industry standard for reliability, ensuring repeatable low-drift performance over time. An independent diagnostic/service port permits users to troubleshoot or change flow conditions without removing the mass flow controller from service. The flagship GF125 is a second generation multi-variable, pressure transient insensitive mass flow controller. This product builds upon Brooks’ leadership position in pressure transient insensitive (PTI) mass flow controller technology, minimizing process gas flow variation due to pressure and temperature fluctuations. The GF125 enables customers to simplify and reduce the size and cost of gas panels by eliminating the need for point of use pressure regulators, pressure transducers, and associated hardware. MultiFlo™ gas and range programmability, a patented technology developed and refined by Brooks over the last 10 years, has changed the mass flow controller industry by offering customers the ability to select new gas calibrations and full scale ranges without the trouble and cost of removing the mass flow controller from the gas line. The GF Series fourth generation MultiFlo technology continues to lead the market with the most accurate and broadest range performance through extensive refinement and physical validation on critical process gases. The GF100 Series is a highly configurable platform based on a novel modular architecture. Already widely adopted by semiconductor, vacuum thin film, solar, and related customers, the GF100 Series feature set was carefully selected to enable drop-in replacement and upgrade of most brands of metal-seal mass flow controllers, including the former Celerity, UNIT, Tylan, and Mykrolis brands. With the wide range of options and features available, the GF100 Series provides users with a path to simplification and standardization, greatly reducing spares inventory and support costs.

Features and Benefits User Interface • Easy installation, start-up, and operation Convenient Service Port • Easy diagnostics and troubleshooting • Independent of tool communication Magnetically Coupled Valve • Corrosion resistant all metal valve • Diaphragm free design, unaffected by differential pressure • High purge rate capability • Tested for over seven million cycles with no failures Pressure Sensor • Stable flow control regardless of upsets or fluctuations in delivery pressure Second Generation T-Rise Sensor • Excellent long-term stability (<+0.5% F.S/yr.) • Improved signal to noise...

Set Point (% of Full Scale) By combining Brooks’ patented flow sensor technology with a high speed ARM processor and fast acting diaphragm free valve assembly, the GF100 Series delivers up to 3 times faster response and settling time compared to other mass flow controllers, enabling: • Improved wafer throughput by reducing nonproductive flow settling steps • Critical Etch processes requiring ultrafast 1-2 second etch steps • Reduced diverted gas consumption and associated abatement costs • Time-sensitive gas delivery steps in Atomic Layer Deposition • For processes requiring a slow ramped...

Product Description MultiFloTM Configurator Accessory Kits: 778Z010ZZZ Basic MultiFlo Configurator Kit *Software, MultiFlo Configurator 124Y211AAA Best/Multiflo Cable - USB to RS485 778Z011ZZZ 124Y211AAA A332295001 A332297002 A332297001 Basic MultiFlo Configurator Kit w/Power Supply and Adapter Cables *Software, MultiFlo Configurator Best/Multiflo Cable - USB to RS485 Power Supply MFC Cable, Power, 9-Pin Cable, Power, DeviceNet * ultiFlo Configurator Software is available on the Brooks M Instrument website at: www.BrooksInstrument.com/MultiFlo Pressure Transient Insensitivity (PTI) (GF125...

Product Description High Purity Flow Path All metal, corrosion resistant flow path with reduced surface area and un-swept volumes for faster dry-down during purge steps: • SEMI F-20 compliant wetted flow path • 4 µ inch Ra max surface finish standard (10 µ inch Ra on GF100) • Highly corrosion resistant Hastelloy C-22 valve seat and jet orifice Extensive Mechanical Configuration Support GF100 Series supports all metal seal / UHP industry gas connection interface standards for full OEM and process coverage • Downport 80mm and 92mm C-seal and W-Seal, on 1.125” and 1.5” bodies • Downport 80mm...

Product Specifications (Standard GF Series) Performance Full Scale Flow Range (N2, Eq.) Flow Accuracy Repeatability & Reproducibility Response Time (Setting Time) Normallly Closed Valve Normally Open Valve Pressure Insensitivity < 5% SP up to 5 psi/sec upstream press. spike Control Range 2-100% (Normally Closed Valve) 3-100% (Normally Open Valve) 11 bins Standard Valve: < 1% F.S., Zero Leak Valve: SH40 -SH41 < 0.02% F.S. SH42-SH50 <0.005% F.S. 2% of F.S. Valve Shut Down (N.C. Valve)¹ Valve Shut Down (N.O. Valve) Zero Stability Temperature Coefficient Ratings Operating Temperature Range...

Product Description GF120 Safe Delivery System (SDS) Options The GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes. The Brooks GF120 (SDS) models are available in full scale flow ranges 4-25 sccm (option GF120XSL) or >25 sccm to 1 slpm (option GF120XSD). These expensive, hazardous gases are adsorbed onto a solid medium within the gas cylinder, remaining below atmospheric pressure despite containing up to 15 times more dopant than...