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Application overview for wafer cleaning

Application overview for wafer cleaning

Application overview for wafer cleaning

Product catalog summary
Equipment and Application Overview
This document provides an overview of the CP-PC-9000E, focusing on semiconductor wafer cleaning equipment. The equipment is designed to remove impurities such as organic substances and metals from wafer surfaces using solvents and chemicals. There are two types of equipment: batch equipment, which immerses multiple wafers in the processing layer, and single-wafer equipment.
Applicable Industry and Processes
The equipment is applicable to the semiconductor manufacturing industry, specifically for front-end processes. Typical equipment includes wafer cleaning equipment and FOUP nitrogen purge flow control systems.
Product Solutions
  • Digital Mass Flow Controller (MQV_ _ _ _): Used for N₂ flow control for chemical spray nozzles.
  • Micro Flow Rate Liquid Flow Meter (F7M): Measures chemical flow rates.
  • Network Instrumentation Modules (NX- _ _ _): Controls chemical solution temperature.
  • High-Accuracy Position Sensors (K1G_ _ _): Used for wafer alignment.
  • Chemical-Resistant Fiber-Optic Sensors (HPF-T029): Detects wafers remaining in a cleaning bath.
  • Pipe-Mounted Liquid Level Switches and Sensors: Detects liquid levels and leaks.
  • Flat U-Shape Fiber Unit (HPF-T054-L05): Used for stroke detection for valves for IPA.
Application Examples
Each product solution is accompanied by application examples, identified by document numbers (e.g., CP-PC-9000-006E for micro flow rate liquid flow meter applications).
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Catalog excerpts

Application overview for wafer cleaning-1

azbil Equipment and Application Overview Please read “Terms and Conditions” from the following URL before ordering and use. https://www.azbil.com/products/factory/order.html Other product names, model numbers and company names may be trademarks of the respective company. Azbil Corporation Advanced Automation Company 1-12-2 Kawana, Fujisawa Kanagawa 251-8522 Japan URL: https://www.azbil.com Wafer Cleaning Equipment [Notice] Specifications are subject to change without notice. No part of this publication may be reproduced or duplicated without the prior written permission of Azbil Corporation. Azbil Corporation

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Application overview for wafer cleaning-2

For the challenges confronting the semiconductor industry —higher quality, higher productivity, preventive maintenance— we provide a wide variety of solutions. Applicable industry Manufacturing process Semiconductor Front-end processes Wafer cleaning equipment Typica| Equipment description: Removes impurities such as organic substances and equipment metals from the wafer surface using solvents and chemicals. There is batch equipment (immerses multiple wafers in the processing layer) and single-wafer equipment. FOUP nitrogen purge flow control Chemical flow rate measurement Stroke detection for...

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.