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ARGOLIGHT ARGO-POWERHM

ARGOLIGHT ARGO-POWERHM

ARGOLIGHT ARGO-POWERHM

Product catalog summary
Introduction
The Argo-POWERHM is a device designed for evaluating the performance of fluorescence-based imaging systems, including wide-field, confocal, and spinning disk microscopes with high magnification objectives. It includes a calibrated optical power meter, Argo-HM patterned glass, and Daybook image analysis software.

Components
  • Calibrated Optical Power Meter: Measures optical power at the sample plane in microscopy setups.
  • Argo-HM Glass: Contains fluorescent patterns for system evaluation.
  • Daybook Software: Analyzes images to extract data and control system parameters.

Fluorescence Properties
Patterns are excitable from 350 nm to 650 nm, with emission efficiency decreasing towards the red spectrum. Under normal use, fluorescence stability is maintained, with transient decreases under specific conditions that recover over time.

Patterns Compatibility
The glass is compatible with dry and oil immersion objectives, while the power meter is only compatible with dry objectives. Continuous water immersion exposure should not exceed five minutes.

Technical Specifications of the Power Meter
  • Detector Type: Silicon photodiode
  • Active Detector Area: 10 mm diameter
  • Wavelength Range: 350 – 1100 nm
  • Power Range: 10 µW – 100 mW
  • Linearity: ± 2%
  • Calibration Uncertainty: ± 10% maximum, typically ± 2% at 633 nm
  • Response Time: 100 ms minimum, 3 s for stable reading

Patterns Overview
The slide contains 10 types of patterns, each designed for specific testing purposes:
  • Pattern A: Concentric circles for target alignment.
  • Pattern B: Field of rings for spatial resolution.
  • Pattern C: 4x4 intensity squares for intensity calibration.
  • Pattern D: 2x16 intensity rectangles for linear intensity evaluation.
  • Pattern E: Gradually spaced lines for resolution testing.
  • Pattern F: Matrix of crosses for depth and alignment testing.
  • Pattern G: Meridians of a sphere for 3D alignment.
  • Pattern H: Repositioning crosses for spatial calibration.
  • Pattern I: 3D crossing stairs for depth measurement.
  • Pattern J: Company logo for branding.

Patterns Positioning
Patterns are positioned 170 ± 5 µm below the top glass surface, emulating a microscope coverglass. The maximum relative positioning error is ± 110 nm in XY and Z directions, with a thickness of 600 ± 200 nm FWHM.
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Catalog excerpts

ARGOLIGHT ARGO-POWERHM-1

Introduction The Argo-POWERHM is specifically designed to assess and follow the performances of fluorescence-based imaging systems, such as wide-field, confocal, spinning disk and other types of microscopes, with high magnification (HM) objectives. This product is composed of a calibrated optical power meter, an Argo-HM patterned glass and Daybook, their companion image analysis software. The calibrated optical power meter is designed to measure the optical power of light sources at the sample plane in microscopy setups. The Argo-HM glass is a special glass substrate with different fluorescent patterns embedded inside. Daybook software allows to analyze and extract data (maps, graphs and metrics) from images of the patterns, in order to control significant parameters of your fluorescence imaging system. Objective compatibility The glass part is compatible with dry and oil immersion objectives. Water immersion is possible, but continuous exposure longer than five minutes should be avoided. The optical power meter is only compatible with dry objectives. Argolight - 2019 - [email protected] - www.argolight.com

 Open the catalog to page 1
ARGOLIGHT ARGO-POWERHM-2

Spec sheet ARGOLIGHT ARGO-POWERHM device for fluorescence imaging systems 03/2019 Patterns position inside the glass Patterns are positioned (170 ± 5) μm below the top glass surface, on a horizontal plane which flatness is within ± 5 mrad. This emulates the presence of a microscope coverglass, having a thickness of (170 ± 5) μm and a refractive index of (1.5255 ± 0.0015) at 546.1 nm. The maximum relative positioning error is ± 110 nm in XY and ± 110 nm in Z within each individual pattern. The thickness (in the Z direction) of these patterns is about (600 ± 200) nm FWHM (Full Width at Half Maximum)....

 Open the catalog to page 2

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