PARAMOUNT® PLUS PULSED-RF POWER SUPPLIES PREMIER PULSING TECHNOLOGY FOR EMERGING PLASMA APPLICATIONS

PARAMOUNT® PLUS PULSED-RF POWER SUPPLIES Push the boundaries of innovation with powerful plasma control.

Paramount® Plus Pulsed-RF Power Supplies With multi-level pulsing, pulse waveform control, and the broadest feature set available in a pulsed-RF product, the Paramount® Plus platform allows you to push the boundaries of process innovation and delivers the best value in the marketplace. Excellent plasma stability, precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition provide the extreme latitude in plasma control required for next-generation nodes. BENEFITS ■ Precise RF and pulse control ■ Enhanced plasma stability and process repeatability ■ Fast response to plasma...

Incomparable Value With a uniquely broad and powerful feature set, the Paramount® Plus power supply is the industry’s most cost-effective solution. Based on the proven Paramount platform, it delivers performance repeatability and reliability you can bank on. BENEFITS ■ Precise RF Control ■ Enhanced plasma stability ■ Flexibility and adaptability for advanced manufacturing technologies FEATURES ■ Full digital control ■ Single- and dual-level pulsing ■ Pulse synchronization ■ Pulse waveform control ■ Real-time power and impedance measurement ■Real-time pulse monitoring ■ Advanced FastDAQ™ data...

PARAMOUNT® PLUS PULSED-RF POWER SUPPLIES Powerful Pulse Control for Emerging Applications Sophisticated multi-level pulsing and pulse waveform control enable the pulse-shape repeatability into dynamic loads required for tomorrow’s device geometries. Multi-Level Pulsing Two Power Set Point Levels Over Full Power Output Range Plasma operation maintained during pulse low state, reducing impedance swing when pulse goes to high (source) Ability to set two separate ion-energy peaks (bias) Single-Level Pulsing Dual-Level Pulsing High Duty Cycle

Pulse Waveform Control Precise, Repeatable Pulsing ■ Flat forward-power pulse waveform ■ Clean rise time ■ Limited over-shoot Independent Control of Pulse Rise and Fall Times from ~1 to 25 psec ■ Impact of sudden plasma impedance change minimized by reducing reflected power “spike” at pulse level change Exceptional Process Insight Real-time pulse monitoring and available FastDAQ™ data acquisition provide unique access to crucial parameters for advanced process development and system troubleshooting. FastDAQ™ Data Acquisition ■ Reduced need for directional coupler and oscilloscope ■ Monitoring...

Paramount® Plus 1 Electrical specifications vary by model number. Please contact an AE representative for more information. Paramount® Plus and Navigator® II Optimized RF Power-Delivery System Optimized to perform seamlessly with Paramount Plus power supplies, Navigator® II matching networks enable precise plasma process control, with tuning-while-pulsing over a wide pulse frequency and duty cycle range.

Advanced Energy ABOUTADVANCED ENERGY Advanced Energy (AE) has devoted more than four decades to perfecting power for its global customers. AE designs and manufactures highly engineered, precision power conversion, measurement and control solutions for mission-critical applications and processes. AE’s power solutions enable customer innovation in complex semiconductor and industrial thin film plasma manufacturing processes, demanding high and low voltage applications, and temperature-critical thermal processes. With deep applications know-how and responsive service and support across the globe,...