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Ascent DMS datasheet

Ascent DMS datasheet
1 / 8Pages

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Facilitating Process Innovation for Tomorrow’s Advanced Applications The Ascent DMS series offers unprecedented power delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics. With selectable frequency, regulation mode, and duty cycle, as well as low stored energy and simplified, modular system configuration, the Ascent DMS accessory distinguishes itself as truly next-generation technology. Cost-effective, scalable, and versatile, it minimizes complexity, increases quality, and boosts throughput to enable advanced process innovation. ®

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Product Highlights ■ For all dual-magnetron sputtering applications ■ Increased film value: repeatable, customizable deposited films ■ Lower cost of ownership and increased productivity ■ Lower upfront costs ■ Higher power levels with reduced arc damage ■ Easy scalability, integration, and support ■ Modular and scalable (40, 60, and 120 kW units configurable up to 240 kW) ■ Selectable frequency (500 Hz to 50 kHz) ■ Power, current, or voltage regulation ■ Adjustable duty cycle — independent power ratio regulation for each magnetron ■ Pulsed-DC and bipolar Pulsed-DC operation ■ Lowest arc...

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v (V) l (A) End Boost Turn-On Turn-Oﬀ Current: Fast slew rate and higher startup threshold are desired Process Voltage Optimized bipolar waveform for dual-magnetron sputtering applications Increased Film Value: Repeatable, Customizable Deposited Films Create the ideal film density, uniformity, transmission, and resistivity for your application by selecting frequency (500 Hz to 50 kHz), regulation method (voltage, current, or power), and duty cycle (5 to 95%). Fixed-frequency output stabilizes process conditions by eliminating resonant frequency changes, resulting in excellent repeatability....

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Easy, Custom Installation Options Modular and scalable, Ascent DMS accessories enable customized installations from 40 to 240 kW, and provide DC and pulsed-DC outputs from the same industry-standard 19" rack. Lower Cost Ownership and Increased Productivity The ability to individually control each magnetron increases target-erosion uniformity, while fixed-frequency output reduces arc energy and target nodule formation. These factors significantly reduce maintenance frequency and lengthen productive manufacturing time. They also decrease the cost of consumables by allowing target utilization...

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Easy Scalability, Integration, and Support Ascent DMS units are modular and scalable, delivering 40 to 240 kW in increments of 30, 40, and 60 kW. CEX (phase synch) technology easily synchronizes multi-cathode systems and allows cathodes to be placed closer together for better uniformity. This versatile series suits a mix of cathode types and allows co-sputtering of controlled mixtures of materials. Reduced configuration complexity also eases maintenance and support. Specifications Ascent DMS 40 kW Input Power Output Voltage Output Current Ethernet, EtherCAT®, Profibus®, RS-232/485, analog,...

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ASCENT® DMS Advanced Dual-Magnetron Sputtering Accessories

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Advanced Energy ABOUT ADVANCED ENERGY Advanced Energy (AE) has devoted more than three decades to perfecting power for its global customers. AE designs and manufactures highly engineered, precision power conversion, measurement and control solutions for mission-critical applications and processes. AE’s power solutions enable customer innovation in complex semiconductor and industrial thin film plasma manufacturing processes, demanding high and low voltage applications, and temperature-critical thermal processes. With deep applications know-how and responsive service and support across the...

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Ascent DMS datasheet 1 / 8Pages

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Ascent DMS datasheet
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