UV 400 Pyrometer Datasheet


Catalog excerpts

UV 400 Pyrometer Datasheet - 1

UV400 ANDUVR400 True wafer surface temperature and reflectance instrumentation for GaN-based epitaxy. The UV 400 and UVR 400 systems are the next generation of temperature sensors developed specifically for GaN-based MOCVD epitaxy processes. These pyrometers allow direct measurement of the wafer surface temperature instead of the traditional susceptor/pocket temperature. Temperature Ranges PRODUCT HIGHLIGHTS ■ Improved yield through accurate true wafer temperature measurement ■ Measure temperature directly on the GaN layer using UV wavelength instrumentation ■ Obtain reliable wafer temperature with PL wavelength correlation ■ Capture real time reflectance measurement using a fast pulsing light source ■ Prevent residue temperature oscillation as seen in NIR emissivity-compensated pyrometers ■ Prevent data skew due to delayed sampling (no shutter on and off) ■ Minimize noise in measurement using true photocounting instrumentation TYPICAL APPLICATIONS ■ GaN-based MOCVD epitaxy processes Spectral Range 383 to 410 nm (10% of values) Measurement Uncertainty < 1000°C: 3°C > 1000°C: 0.3% oR Repeatability 0.1% oR + 0.1°C Optics Fixed optics Field of View min 8:1 (9.8 mm) Output 0/4 to 20 mA, RS485 ©2019 Advanced Energy Industries, Inc.

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UV 400 Pyrometer Datasheet - 2

Direct measurement allows for more accurate control of the wafer temperature leading to an improved yield. These systems are setting a new standard for LED production processes with results showing reliable correlation between process temperature and final product wavelength. The UVR 400 includes an additional reflectometer at 635 nm with 0.5 kHz measurement speed. This enables measurement of deposition thickness. The U400 predecessor, the TR 2100, was the first pyrometer with the integrated reflectometer (in 2001), establishing the industry standard for active emissivity compensation for...

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UV 400 Pyrometer Datasheet - 3

Environmental Specifications 1The pyrometer must be in operation for 30 minutes before these values are valid. 2MB is a shortcut used for temperature range (in German: Messbereich). The determination of the technical data of this pyrometer is carried out in accordance with VDI/VDE IEC TS 62942-2, the calibration / adjustment in accordance with VDI/VDE 3511, Part 4.4.

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UV 400 Pyrometer Datasheet - 4

Side View Top View Bottom View

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UV 400 Pyrometer Datasheet - 5

OPTICS The pyrometer is equipped with the optics listed below. The optics are focused for a specific distance, which means that at that distance the optics have their smallest possible spot size in relation to the measuring distance. If the distance from the object being measured is increased or decreased, the spot size changes. The table below shows examples of distances and the corresponding spot diameters:

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UV 400 Pyrometer Datasheet - 6

GaN material emits below 400 nm in the ultraviolet spectrum and improvements in short wavelength detectors allow for measurement of the epitaxial layer temperatures. Unlike NIR measurement, UV measurement only measures the GaN layer. Near 400 nm, a relatively thin GaN layer becomes opaque and the pyrometer does not see through the wafer. This results in a direct measurement of the wafer surface!

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UV 400 Pyrometer Datasheet - 7

INFRAWIN 5 OVERVIEW InfraWin is easy-to-use measurement and evaluation software for remote configuration of stationary, digital IMPAC® pyrometers. This software allows the user to remotely adjust and control settings for one or two pyrometers from a single computer. InfraWin also allows the user to simultaneously monitor and control temperatures.  Display temperature data as color bars and online graphics  Capture downstream evaluations as tables, graphics or text files  Calculate the spot size for different measuring distances  Features UPP standard (Universal Pyrometer Protocol)...

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UV 400 Pyrometer Datasheet - 8

Advanced Energy For international contact information visit advancedenergy.com. sales.support@aei.com +1 970 221 0108 ABOUTADVANCED ENERGY Advanced Energy (AE) has devoted more than three decades to perfecting power for its global customers. AE designs and manufactures highly engineered, precision power conversion, measurement and control solutions for mission-critical applications and processes. AE’s power solutions enable customer innovation in complex semiconductor and industrial thin film plasma manufacturing processes, demanding high and low voltage applications, and...

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