ULC TECHNOLOGY
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ULC Technology For thin layer deposits easy, efficient and environmentally friendly Your Project Our know-how PUT OUR TECHNOLOGIES TO THE TEST First samples treated for free with no commitment. PROCESS STUDIES AND PROOF OF CONCEPT Developing new processes together. Control your costs ! By optimising your processes with the help of our technologies EQUIPMENT SALE AND RENTAL All our products are designed and fabricated in – house.

Improve or reduce adhesion of glues and coatings Deposit a layer of interest Anti-corrosion Anti-scratching Other... Discover our equipment for thin layer deposits V-COAT The most economical deposition technology for the least reactive precursors in ambient air. Liquid compatibility : Precursor SiOx : HMDS & TEOS. Others according to study. Integrated precursor line thin layers 1 to 300 nm Versatile deposition technology for the most air-reactive precursors. Liquid compatibility : it's up to you to find out! Interchangeable precursor line thin layers 1 to 300 nm