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ULC TECHNOLOGY

Product catalog summary

Overview
ULC Technology offers process studies and proof of concept services to develop new processes collaboratively. They provide free initial sample treatments without any commitment, allowing clients to test their technologies.

Equipment Sale and Rental
All products are designed and fabricated in-house, available for sale or rental. The company emphasizes cost control by optimizing processes with their technologies.

Applications
ULC Technology specializes in thin layer deposits that are easy, efficient, and environmentally friendly. Applications include improving or reducing adhesion of glues and coatings, and depositing layers for anti-corrosion and anti-scratching purposes.

Technologies

S-COAT: A versatile deposition technology suitable for the most air-reactive precursors.
V-COAT: The most economical deposition technology for less reactive precursors in ambient air.

Specifications
Thin layers range from 1 to 300 nm. The technology supports liquid compatibility with precursors like SiOx, HMDS, and TEOS, with other options available upon study.

Contact Information
For more information, visit www.acxys.com or contact via phone at +33 476 756 079 or email at [email protected].

Catalog excerpts

ULC Technology For thin layer deposits easy, efficient and environmentally friendly Your Project Our know-how PUT OUR TECHNOLOGIES TO THE TEST First samples treated for free with no commitment. PROCESS STUDIES AND PROOF OF CONCEPT Developing new processes together. Control your costs ! By optimising your processes with the help of our technologies EQUIPMENT SALE AND RENTAL All our products are designed and fabricated in – house.

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Improve or reduce adhesion of glues and coatings Deposit a layer of interest Anti-corrosion Anti-scratching Other... Discover our equipment for thin layer deposits V-COAT The most economical deposition technology for the least reactive precursors in ambient air. Liquid compatibility : Precursor SiOx : HMDS & TEOS. Others according to study. Integrated precursor line thin layers 1 to 300 nm Versatile deposition technology for the most air-reactive precursors. Liquid compatibility : it's up to you to find out! Interchangeable precursor line thin layers 1 to 300 nm

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ULC TECHNOLOGY

ULC TECHNOLOGY

Catalog excerpts

All AcXys Technologies catalogs and technical brochures