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Achieve results typically found in production scale equipment and enhance your CMP research capabilities with this floor standing CMP tool.
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→→Floor standing CMP tool ideally suited to R&D environments - typically used in applications which conduct pilot production tests. →→ High capacity works pace for two samples up to 200mm/8” - or multiple smaller samples through the use of templates The CMP Orbis is a precision engineered, floor standing Chemical Mechanical Polishing (CMP) system ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced process performance. →→Produces results typically seen on production scale equipment...
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TECHNICAL SPECIFICATIONS Carrier sizes available: Power Supply: Plate diameter: Carrier speed: Slurry flow rate:
カタログの3ページ目を開くLogitech Limitedのすべてのカタログと技術パンフレット
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