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Maximize working space with Long Working Distance Objectives

Maximize working space with Long Working Distance Objectives
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Maximize working space with Long Working Distance Objectives With a generous parfocal distance of 95mm*, Optem® Long Working Distance Objectives are the perfect machine vision and industrial imaging solution when you need to maximize working space in and around your subject. Select from the growing line of Optem M Plan APO Objectives when flatfield precision, color accuracy and even illumination are critical... ideal for metrology! With a 50% boost in numerical aperture, turn to the field-proven imaging power of Optem High-Resolution Objectives to achieve the finest detail possible and leverage your high-magnification potential. • • • • • 50X M Plan Apo, Long Working Distance 20X M Plan Apo, Long Working Distance 10X M Plan Apo, Long Working Distance 5X M Plan Apo, Long Working Distance 2X M Plan Apo, Long Working Distance • 20X High-Resolution, Long Working Distance • 10X High-Resolution, Long Working Distance • 5X High-Resolution, Long Working Distance Contact Qioptiq Imaging Solutions today for competitive pricing. Ask about private labeling options and custom objective solutions. * Parfocal distance measured from the objective shoulder to the object plane EHD imaging GmbH www.ehd.de www.qioptiqimaging.com Optem™ is a trademark of Qioptiq Imaging

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Maximize working space with Long Working Distance Objectives - 2

OPTEM® M PLAN APO, LONG-WORKING DISTANCE OBJECTIVES OBJECTIVE DESCRIPTION NUMERICAL APERTURE WORKING DISTANCE BACK FOCAL OPTEM® HIGH-RESOLUTION, LONG-WORKING DISTANCE OBJECTIVES OBJECTIVE DESCRIPTION NUMERICAL APERTURE WORKING DISTANCE BACK FOCAL *Optem High-Resolution Objectives are specifically designed for use with Optem Lens Systems. Not intended for use with conventional microscope optics. OPTEM HIGH-RESOLUTION OBJECTIVES Specifically designed to maximize optical performance over the wider fields-of-view achievable at low magnification with Optem® CCD Lens Systems and A-Zoom...

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