Low Temperature Dual Filament Source
5Pages

Dual Filament Source 1 6cc Low Temperature Dual Filament Source. The Veeco Low Temperature Dual Filament Source for MBE uses two independent heaters to control the temperature variation along the length of the crucible. The primary heater filament heats most of the crucible. The tip filament heats just the mouth region of the crucible to compensate for the greater radiative heat loss in this area. The source is operated in hot-lipped mode to eliminate material recondensation at the crucible orifice, which can lead to source occlusion The Low Temperature Dual Filament Source is enclosed in a heat-shielding package designed for optimal source responsiveness and stability in the operating range of 100-750°C. Temperature stability is critical with high vapor pressure materials, since even a small temperature variation produces a dramatic change in the flux. • Largest capacity • Shutter transients virtually material quality • Uniformity depends on fill level and crucible shape • Shutter transients reduced material quality • Uniformity depends on fill level and crucible shape • Shutter transients may exist material quality In comparison, the SUMO Source is the best available source for non-valved evaporation of high vapor pressure materials. :h,vn ll-ie'iT-ncc-L.p es, "I lol Lip" IL.enriil gri-.d enl; (Two viornccfxiolfjs. "Hot i p" Llicrr-ui gmdiar'.j (Two thermocouples, "Hot Lip" thermal gradient) • Patented design with • Dual filament hot-lip crucible orifice • Excellent long-term flux stability with high vapor pressure Beam equivalent pressure shows rapid flux stabilization as the Low Temperature Dual Filament Source is heated from idle to operating temperatures with three different charge materials.

The Low Temperature Dual Filament Source is also available in the high-performance SUMO® design. See the “Low Temperature SUMO Source” data sheet for further details. Performance and Benefits The Low Temperature Dual Filament Source is precisely tailored to the demands of evaporating high vapor pressure materials. Benefits include: • Optimal performance at lower operating temperatures • Rapid flux stabilization • Excellent long-term flux stability Dual Filament “hot-lip” heating prevents condensation at the crucible orifice. This has been proven effective with a number of “difficult”...

Product Specifications for Single-Wafer MBE Systems Source Characteristics 16cc Charge Materials Recommended for use with high vapor pressure materials typically evaporated or sublimed in the 100-750°C range Crucible Shape Filament Type Dual Ta wire heater filaments, independently controllable Minimum Mounting Flange Size Standard With Water-Cooling Thermocouple Type Two Type K (Chromel/Alumel). One patented band thermocouple, one flag thermocouple In-Vacuum Length With Water-Cooling Typical Operating Temperature Maximum Outgassing Temperature Base Power Requirements for Maximum Temperature...

Product Specifications for Multi-Wafer MBE Systems Source Characteristics 190cc Charge Materials Recommended for use with high vapor pressure materials typically evaporated or sublimed in the 100-750°C range Crucible Shape Filament Type Dual Ta wire heater filaments, independently controllable Minimum Mounting Flange Size Standard With Water-Cooling Thermocouple Type Two Type K (Chromel/Alumel). One patented band thermocouple, one flag thermocouple In-Vacuum Length Contact Veeco Contact Veeco Typical Operating Temperature Maximum Outgassing Temperature Base 1000°C Tip Power Requirements for...

Selection Guide Typical Source Commonly Used Indicated By “X” System 16cc GEN II™ Veeco sources are also available for use on systems from Eiko, Anelva, Ulvac, SVTA, and DCA, as well as custom chambers. Contact Veeco for details. Solutions for a nanoscale world.™ Compound Semiconductor • MBE Operations 4900 Constellation Drive, St. Paul, MN 55127 USA Phone: (651) 482-0800, Fax: (651) 482-0600 www.veeco.com/mbe © 2009 Veeco Instruments Inc. All rights reserved. (6-09) SUMO, GEN200 and GEN2000 are registered trademarks and GEN II, GEN III, GEN930, GEN10, GEN20 and Solutions for a nanoscale...