Laser Doping System - Synova - #1

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The Laser Chemical Doping Technology The efficiency of solar cells can be increased by locally diffusing dopant underneath the front contacts, so-called selective emitters. Laser Chemical Doping uses a laser beam to groove, if necessary, the passivation layers and a chemical jet, in which the laser beam is guided, that simultaneously introduces local doping at the surface of the silicon wafers. Thin selective emitters can be produced with a laser-based industrial process. A manual loading Laser Chemical Doping system is now available from Synova. Targeting development and test laboratories, it offers a unique blend of flexibility and freedom to tailor the Laser Chemical Doping process to one’s specific solar cell structure. Numerous advantages The LCP offers radically new solutions for doping of solar cells: • Up to 20.4% efficiency already demonstrated • Fast and simple process for selective emitter formation • AR layer opening and groove doping in one step • Compatible for P-type back-side doping • Doping possible before and after SiNx deposition • Excellent ohmic contacts manufactured • Contact resistance reduced below 1 mÙcm2 • No need for separate etch, diffusion and anneal • Selective emitters sufficiently doped for screen-printing and electroplating • Greatly reduces line widths (down to 20ìm) in combination with Ni plating • Versatile process as other steps can be added (e.g. seeding) as the technology evolves N e w P r o d u c t A n n o u n c e m e n t Laser Doping System by Laser-Chemical Processing (LCP) Patented by and