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| | | T • Deep UV Enhanced | | |
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| | | Characteristics O Step Index O Numerical Aperture: 0.22 ± 0.02 Full Acceptance Cone: 25.4 degrees O UV-C Region x <280 nm O Superior Radiation Resistant O High Laser Damage Threshold | | |
| | | O Sterilizable* O High -OH Silica Core, Doped Silica Clad O Polyimide/Acrylate Buffer Available O Polyimide Concentricity ± 3pm O Tighter Tolerances Available O Proof Tested to 100kpsi | | |
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| | | The end manufacturer is responsible for bio-compatibility and sterilization testing and validation studies. | | |
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| | | | | | | | | | | | Product Descriptor | Core (Mm) | Clad (Mm) | Buffer (Mm) | | | | FDP200220240* | 200 ± 4 | 220 ± 4 | 240 ± 5 | | | | FDP600660710* | 600 ± 10 | 660 ± 10 | 710 ± 10 | | | | FDA200240340 | 200 ± 4 | 240 ± 4 | 340 ± 8 | | | | FDA600660760 | 600 ± 10 | 600 ± 10 | 760 ± 10 | | | | | | | | | | | |
| | | Note: The items listed in this table are standard configurations and sizes. Other configurations may be available on request. Please let us know what we can do to help satisfy your project requirements. | | |
| | | High -OH Core Doped Silica Clad Polyimide Buffer | | |
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| | | * Operating -65°C to +300°C; Intermittent, up to 400°C | | |
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| | | UV Damage versus Wavelength, Deuterium lamp, after saturation
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| | | Basic UV Attenuation | | |
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| | | 3.0 | | | | | | | | | FVP200220240UVM | L = 1.0m | | | | FDP200220240 \ | | | | | | | | | | | | | | | |
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| | | 200 | | 250 300 Wavelength (nm) | | 350 | | |
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| | | Wave 16 UV Damage & Recovery versus Time, Deuterium lamp, X = 214nm 3 | | |
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| | | UV Damage versus Wavelength, Excimer Laser, X = 193nm | | |
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| | | X = 193nm 50mJ/cm2 100Hz 17ns pulse width L = 0.5m | | |
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| | | 250 300 Wavelength (nm) | | |
| | | 0:00:00 0:00:00 12:00:00 Time ķi;” rnnTi | | |
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| | | • Flexible Capillary • Multimode Optical Fiber • Specialty Assemblies • Micro-Components | | |
| | | 18019 N. 25th Avenue • Phoenix, AZ 85023-1200 Voice: (602) 375-4100 Fax: (602) 375-4110 E-Mail: sales@polymicro.com URL: http://www.polymicro.com | | |
| | | Polymicro Technologies, LLC QUALITY MANAGEMENT SYSTEM CERTIFIED BY DNY -ISO 9001:2000 = | | |
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| | | PT-FD/09-05 | | |
| | | Copyright © 2005 Polymicro Technologies, LLC | | |
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