Electron Source for AES, SAM and SEM

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The small-spot electron source EKF 1000 providesa compact and cost-effective solution for a wide range of SAM and SEM applications as well as static AES. It offers a highly stabilised beam current, and an achievable spot size

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filament enablinga high maximum beam current. Quadrupole x/y- deflectors are employed for static and dynamic beam deflection in SAM and SEM imaging.The NGE 52 control unit covers the energy rangefrom 100 eV to 5 keV and features a highly stabi- lised emission-regulated filament supply to enable reliable quantitative Auger analysis. The separate scan control unit (SCU) features both internal TV rate and PC controlled scanning.

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