EFM Evaporators

EFM Evaporators

EFM Evaporators

Product catalog summary
Overview of EFM Evaporators
EFM evaporators are engineered for ultra-pure thin film growth, supporting evaporation from various materials at temperatures up to 3300 °C. They feature an integrated flux monitor, water cooling, and rear loading for alignment preservation, and are compatible with Lab View-based software for user convenience.
Materials and Applications
Capable of evaporating metals like Fe, Co, Ni, and semiconductors such as silicon, the system ensures precise deposition of delicate materials. A stainless steel crucible with a nozzle is used for Knudsen evaporation of compounds like C60.
Crucible Specifications
Specifications for crucible materials such as tungsten, tantalum, and alumina are detailed, each with specific size capacities and temperature ratings to optimize element and evaporant quantity choices.
Electronics and Software
The EVC 300 and EVC 1200 control units offer power outputs for various tasks, with the EVC 300 supporting both manual and software control via 'EPITASS'. The EVC 100L is an analogue unit lacking a flux monitor.
EFM Models
  • EFM 2: Basic, cost-effective model without shutter and flux monitor.
  • EFM 3: Includes a flux monitor, integrated shutter, and rear-loading for thin film growth.
  • EFM 3i: Features ion-beam-assisted deposition and ion suppression.
  • EFM 4: Suitable for larger substrates with high evaporation rates.
  • EFM 6: Supports larger crucible capacities for medium-sized tasks.
  • Triple EFM: Contains three independent cells for compound growth without crosstalk.
EFM-H Model
Optimized for atomic hydrogen applications, the EFM-H offers high cracking efficiency, low power consumption, and a defined beam profile for cleaning and etching semiconductor surfaces.
Conclusion
EFM evaporators provide precise flux control and are suitable for diverse materials and applications, maintaining ultra-high vacuum conditions for high-purity evaporation processes.
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Catalog excerpts

EFM Evaporators-1

Ultra-Pure Submonolayer and Multilayer Thin Film Growth • Evaporation from Wires, Rods or Crucibles • Integrated Flux Monitor • Water Cooling for Minimum Pressure Rise • Rear Loading for Alignment Preservation • Comfortable Lab View-based PC Software An Oxford Instruments Company

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EFM Evaporators-2

Precise Real-Time Flux Control The EFM evaporators with integrated flux monitor are ideal for high-purity evaporation of a wide range of materials in UHV, ranging from refractory metal wires and rods to delicate, reactive substances evaporated from crucibles. Materials such as Fe, Co, Ni, Pt, Ag, Au, Al, Mo, Ta, W, and also non-conducting materials or semiconductors, e.g. silicon, can be evaporated. Delicate or reactive materials can be precisely and cleanly deposited. Using a stainless steel crucible with a nozzle, a gentle Knudsen evaporation of C60 and many other aromatic compounds is achieved...

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EFM Evaporators-3

Electronics & Software The microprocessorcontrolled EVC 300 makes the operation of all EFM-type UHV evaporators very convenient and safe. The 300 W power output is sufficient for the evaporation of any desired material, except for the extra large crucibles of the EFM 6 where the dedicated EVC 1200 delivers up to 1200 W. All parameters of the EVC 300 can be set manually on the front panel or via the Lab View-based 'EPITASS' software. Automatic temperature monitoring of the evaporator cooling ensures automatic shutdown if a preselectable maximum temperature is exceeded. An external interlock is...

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EFM Evaporators-4

Ultimate Precision down to Sample distance: typically 10-150 mm Minimum radius for clearance at shutter position: 16 mm Sample distance: typically 10-150 mm Extremely clean evaporation Upgradeable Cost-effective Temperature range: 160 °C - 3300 °C Fully bakeable up to 250 °C The EFM 2 is a basic version of the EFM 3. It features the same proven capabilities in terms of evaporation area, temperature range, reliability etc. as the EFM 3, but without the shutter and flux monitor. The dedicated EVC 100L electronics is a robust analogue supply with 100 W output power and emission regulation for stable...

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EFM Evaporators-5

Ion Lens Flux Monitor Minimum radius for clearance at shutter position: 20 mm Sample distance: typically 10-150 mm Minimum radius for clearance at shutter position: 34 mm Sample distance: typically 10-150 mm Ion-Beam-Assisted Deposition Ion suppression Evaporation area Ø 5 - 20 mm Flux monitor Integrated shutter Specifically designed for a smooth layer growth of difficult materials, the EFM 3i allows the controlled evaporation of the target material, and the generation of ions for Ion-BeamAssisted Deposition (IBAD). The EFM 3i is based on the wellknown EFM 3 evaporator, with the addition of the...

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EFM Evaporators-6

Cooling Water Minimum radius for clearance at shutter position: 36 mm Flange to sample distance: 254 mm Minimum radius for clearance at shutter position: 68 mm Evaporation area Ø > 50 mm Crucible capacitiy up to 10 cm3 Evaporation from wires, rods or crucibles Integrated cooled shutter Water cooling for minimum pressure rise The EFM 6 evaporator extends the EFM product range onto a larger scale. With a NW 63 CF (4.5" OD) base flange and a crucible capacity of up to 10 cm3, the EFM 6 holds about ten times as much material as the EFM 3. Already at a short working distance the evaporation area is...

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EFM Evaporators-7

Cooling Water Side view of EFM-H with leak valve. Minimum radius for clearance at shutter position: 32 mm. Gas Inlet Sample distance: typically 50 to 150 mm Precise dosage of the hydrogen beam is guaranteed by the reliable EFM-series shutter system. (optional) Based on Proven Technology The temperatures, heating power, and other parameters required for the thermal dissociation of H2 molecules at a tungsten surface are very similar to those obtained during operation of the well-known EFM evaporator. It was therefore a tempting thought to use this proven product as the basis for an atomic hydrogen...

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EFM Evaporators-8

Headquarters: Omicron NanoTechnology GmbH Limburger Str. 75 65232 Taunusstein, Germany Tel. +49 (0) 61 28 / 987 - 0 Fax +49 (0) 61 28 / 987 - 185 Web: www.omicron.de e-mail: [email protected] East Grinstead Linköping Moscow Poznan Beijing We have agents and partners worldwide – please check our website to find your nearest contact. Seoul Tokyo Taipei Mumbai Omicron NanoTechnology is part of the Oxford Instruments Group. For more information: www.oxford-instruments.com or just send us an e-mail: [email protected] stabilised flux 70 mA emission. 70 mA emission about 700 ca. 700V V stabilised flux...

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.