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Flat Panel Display
Model 600 Large Area Aligner System
Contact / Proximity Aligner.
Accommodates substrate sizes up to 20”x20”
Flexible design allows small to large substrates to
use the same tooling
Model 5000E Mask Aligner System
Fully automated
mask aligner system with precision
automatic large area alignment and advanced
pattern recognition.
True proximity, hard, soft & vacuum contact modes
Stores process recipes
For substrates measuring from 300mm to 20”x20”
Computer controlled LED microscope lighting for
difficult substrate viewing conditions
Lightsource Grande
Large Area, Collimated UV Lightsource
Power up to 10KW
Accommodates a full range of large
sizes utilizing collimating mirrors
Cleanroom Conveyor Systems
Cleanroom Class 1-10.
Systems with integrated intelligence
Individual modules or complete systems
Designed to individual specifications
Wafer Sorters
Cleanroom Automation Solutions.
Wafers up to 300mm
Flexible, modular design facilitates easy
customization of wafer handling stations
Designed for cassettes or FOUPs
Automation
Nano Imprint Nano Imprint Technology (NIL)
Model 800 MBA Mask Aligner System
with Nano Imprint Module
Semi Automated Optical Mask Aligner with Front
and Backside Alignment. Configured for use in nano
imprint applications.
Featuring OAI Nano Imprint Module for NIL
Includes anti-vibration table
Automated substrate planarization
Optical 4-camera front and backside alignment
Flexible design for fast wafer & mask changes
Touch screen control
Priced to meet most budgets
Motorized backside focus
Motorized auto-leveling and auto gap-setting
Optional chuck and Z-gap digital display
Nano Imprint Module System
High-yield mold release technology.
Technology developed at Hewlett Packard
Low cost solution for R&D
High yield mold release technology
Modular add-on for
mask aligners
Package includes:
OAI Aligner Module
Process controller
Imprint material
Mold
Any OAI
mask aligner system may
be configured with an optional OAI
Nano Imprint Module.
