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Product Overview

PRESSURE MEASUREMENT The MKS Baratron
® capacitance manometer is the industry standard for process pressuremeasurement. This line features gas independent, direct pressure (vacuum) measurement products using MKS’ proprietarycapacitance diaphragm technology. MKS Baratron capacitance manometers cover Full Scale ranges from as low as 20 mTorr to ashigh as 25,000 Torr with three to five decades of dynamic range in absolute and differential measurements. Products range frommetrology-grade premium instruments with 0.05% of Reading accuracy to application-specific process manometers and alldigital models. Both ambient temperature and temperature-controlled instruments (from 45°C to 200°C) are available. Baratron ultraclean gas delivery pressure transducers utilize the proven MKS capacitance diaphragm technology, which provides a wider dynamic range and better stability than conventional strain gauge devices. These miniature robust transducers cover fullscale ranges from 50 psi to 3000 psi with either single-ended or flow-through configurations. Used in gas delivery systems toensure constant, repeatable delivery of gases to process tools, Baratron pressure transducers feature all-metal wetted surfaces withfinishes to less than 5µin Ra. The modular design and small size allow these transducers to interface easily to today’s gas panels andcabinets. Available in versions with integrated local display.

PRESSURE CONTROL

MKS introduced the world’s first automatic pressure control system for vacuum processes, and is stillthe world leader. The broad line includes fast acting exhaust throttle valves, throttling isolation valves, pendulum valves, upstreamproportioning control valves and a range of controllers with advanced electronics and control algorithms for fast operation. Exhaustthrottle valves, both heated and unheated, come in sizes from 1” to 16” I.D. and are optionally configured with the controlelectronics integrated into the valve. These smart valves interface directly to the host computer.

POWER AND REACTIVE GAS

MKS manufactures a family of remote plasma sources that includes the ASTeX
® ASTRON
® reactive gas generator, a compact, self-contained, environmentally-friendly, atomic fluorine and reactive gas generatorfor exceptional chamber cleaning without costly ion bombardment damage. The ASTRON line of remote plasma sources featuresthe high output and high dissociation needed for today’s critical processes. ASTeX LIQUOZON
® and SEMOZON
® ozone generation products lead the industry in deposition, wet cleaning, and resiststripping applications. Featuring patented technology to deliver high concentration and high purity ozone, MKS ozone productscan be provided as individual generators or fully configured delivery subsystems.Designed, developed, and manufactured for reliability, MKS ASTeX microwave generators are high precision, compact andlightweight, with low ripple and are widely used in many semiconductor manufacturing and industrial processes. Application-specific plasma sources and subsystems are available for a wide range of processes—photoresist removal and passivation, chambercleaning, etching and deposition, as well as industrial manufacturing processes. ENI
® power supplies, matching networks and metrology products add critical solid-state power conversion technology to MKS’core capability in plasma management, and enables MKS to offer more highly integrated and higher performance products to itsOEM and end-user customers. ENI is a leading brand of RF power supplies for semiconductor and other thin film processingapplications, as well as for the magnetic resonance imaging (MRI) market. Our DC power supplies are widely used in IC, storagemedia, flat panel display manufacturing, and other coating applications. The complete power delivery product portfolio includesimpedance matching networks and plasma metrology products.

GAS ANALYSIS

MKS develops and manufactures the Spectra
™ product line of component mass spectrometers/residual gasanalyzers (RGA) , atmospheric pressure gas monitoring equipment, and in situ process monitoring instruments that are sold as fully integrated, application-specific packages. Spectra
™ instruments are used in semiconductor manufacturing, magnetic headproduction, and base vacuum and process environment monitoring. Spectra in situ process monitors feature PR Index
™ , whichprovides a standardized index of photoresist contamination for comparison of wafer-to-wafer, lot-to-lot, and tool-to-tool.MKS also designs and manufactures an advanced range of gas analysis products based on its proprietary FT-IR spectrometer, aswell as complementary analysis and control software. Products include FT-IR and NDIR sensors, as well as complete gasmeasurement systems for multiple gas analysis (feed gas, exhaust gas, stack gas and ambient air), bulk gas purity monitoring, andin situ monitoring of process exhaust gases for fault detection, chamber matching, and process recipe development.

CONTROL & INFORMATION TECHNOLOGY

MKS enables customers to more completely monitor and analyze, andmore precisely control, the process chamber environment by integrating critical process components , technologies and data surrounding the process chamber. Process controllers collect data in the process chamber environment by connecting to thesurrounding sensors via digital control network devices . With connectivity hardware and software such as the MKS Blue Box andour TOOLweb
™ integrated framework, we enable the consolidation, synchronization, distribution and analysis of processinformation in real-time across the factory network where it can be used in APC and fault detection applications.