Catalogue Unitek Miyachi - Hermetic Sealing Systems
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Miyachi - 261239, 80612, 14776, 208297
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hermetic sealing

Parallel Seam Sealing system

SM8500

The Windows
®
-based SM8500, packed with advanced features,reliablyperforms welding, brazing, and solderingprocesses on a variety of metals,metal alloys, plated materials, and solder pre-forms. It can be operated as a stand-alone unit or fully integrated into an environmental enclosurefor a complete closed loop hermetic sealing process. The easy-to-use SM8500 is effective for either production or researchand development applications for linear, rectangular or circular part processing. Its Graphical User Interface (GUI) and one-up part tooling enable quick changeover. The robust design of theSM8500 mechanism along with industry leading electronic controls andinternal ethernet communications yield a precise, reliable and simple to maintain system.

Industry Leading Features and Benefits

• Current control mode for sealing process Advanced complex control program is optimized for industry’s best seamsealing results.• Programmable industrial electrode force

TYPICAL APPLICATIONS

Enables user to optimize both the force and energy through programmablesettings to achieve superior results. Five point force calibration for precise force control and consistency.• Most complete line of power supplies manufacturer in the industry Provides low sealing temperatures. Increases yields and productivity.StandardInverter Power Supply with Capacitive Discharge or AC for specialtyapplications.• Extended electrode life with electrode Auto-Trak software By indexing the electrodes we ensure extended and even wear,providingsuperior results.• Position-based weld pulses Provides increased or decreased energy at part corners. Reduces cornerleaks. Solves electrode deceleration and acceleration problems with precise weld pulse spacing.• Electrode roll-back feature To assist electrode release from light weight parts.• Process inhibits Communicates with glovebox to ensure parts are processed only whendesired gas composition is present.
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