Calibre nmOPC - Mentor Graphics - #1

Manufacturability

Calibre nmOPC

DATASHEET

Full Process Window

^S=^ss=phr ^andbe_t^lowpro.^cesses':^clud-

^ta^ond^enp^ar^bo^lt^eec^ut^sio^ern^co^uf^sp^toro^mpⁱr^zi^ae^ttⁱa^orⁿy

OPC process IP.

Low kl photolithography processes are increasing the complexity of RET applications in nanometer designs. At 45nm, more complex models and through process window correction and verification requirements signifi­cantly increase computational burden. Both the lithographic challenges and the computational complexity associated with the 45nm process node create a need for advanced capabilities for computational lithography tools.

Calibre nmOPC answers these challenges by delivering several innova­tions including dense simulation, process window optimized OPC, a hybrid computing platform utilizing co-processor acceleration (with the Cell Broadband Engine™, (CBE) processor), a new compact resist process modeling capability, and contour-based design intent constraints during correction. Like all Calibre family products, Calibre nmOPC and Calibre OPCverify run on the fully integrated Calibre hierarchical geometry engine uniquely enabling a fully integrated design to mask flow. Like all Calibre applications, Calibre nmOPC and Calibre OPCverify use the common, widely used Calibre SVRF command language and the industry standard OASIS file format to minimize output file size.