Catalogue - Calibre nmOPC - Mentor Graphics - (Version JPG)

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Next Génération OPC Capabilities

Dense, Process-window Simulation

Process variability can have a dramatic effect on yield. This is especially true in the lithographic process where dose and focus variability impacts image fidelity and the resultant die yield. To reduce the risk of silicon failure and enable acceptable yield under challenging low k1 conditions, Calibre nmOPC uses both dense simulation capabilities, which provide 100 percent simulation coverage for the mask layer, and process window correction optimization algorithms to ensure silicon-patterning success. Calibre nmOPC also applies contour-based constraint inputs to the correction algorithm to ensure design critical feature-to-feature characteristics preserve design intent and parametric yield across the process

Without CPA

With CPA

MASTER SERVER

SLAVE CLUSTER

Standard CPUs (Opteron, Xénon)

SLAVE CLUSTER

Standard CPUs

(Opteron, Xénon)

ACCELERATION CLUSTER

(Cell BE Processors)

window. These constraints can be multilayer to apply

1) Easy add-on to existing compute cluster

2) Modular - expandable

3) Similar form factor as existing cluster

features such as contacts and v

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Hybrid High Performance Computing Platform

Mentor addresses the rising cost of ownership associated with the geometrically increasing need for more CPUs by introducing a unique Coprocessor Architecture. The Remote Acceleration Simulation (RAS) architecture elegantly enables the option of connecting a Coprocessor Acceleration cluster with an Ethernet connection to an existing compute cluster. Mentor has partnered with Mercury Computer Systems to offer standard Coprocessor Acceleration clusters based on the ultra-high performance

Calibre: AComplete Design-to-Silicon Platform

A powerful hierarchical engine is at the heart ofthe Calibre tool suite, which offers a complete IC design-to-manufacturing solution. Each tool in the Calibre nm Platform is an excellent point tool on its own, but in combination with the other Calibre tools, the handoff from design to manufacturing is

The Calibre RET tool

suite for deliver silicon accuracy, fastest turn around time and excellent yield.

Calibre mask data preparation tools allow for seamless continuation of the data manipulations required for RET techniques to the mask data format conversion in one batch run, keeping data hierarchically represented as long as possible.

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erate Calibre nmOPC enabling 4 to 10 times improvement

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time with little to no increase in g

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purpose

computing requirements over the 65nm

node.

Compact Modeling

Mentor continues its legacy of providing industry-leading modeling accuracy and technology with the introduction of a new 4th generation compact resist process model. The new CM1 model demonstrates better accuracy than its predecessors, meeting customer require-ments for the 45 and 32 nm process generations, and takes full advantage of the dense simulation capabilities of nmOPC and coprocessor acceleration. The automated calibration process for CM1 models yields excellent model stability and eliminates difficult optimization choices for the OPC engineer.

greatly simplified.

In addition, Calibre MT, Calibre MTflex and Hyperscaling enhance performance and reduce turn-around times across the platform.

Visit our website at www.mentor.com

Corporate Headquarters Mentor Graphics Corporation

8005 SW Boeckman Road Wilsonville, OR 97070-7777 Phone: 503-685-7000

Sales and Product Information

Phone: 800-547-3000

503-685-8000

Silicon Valley Headquarters Mentor Graphics Corporation

1001 Ridder Park Drive San Jose, California 95131 USA

Phone: 408-436-1500 Fax: 408-436-1501

North American SupportCenter

Phone: 800-547-4303 Fax: 800-684-1795

Europe Headquarters Mentor Graphics Corporation

Arnulfstrasse 201 80634 Munchen Germany

Phone: 49 (0)8957096-0 Fax: 49 (0)89 57096-400

Pacific Rim Headquarters Mentor Graphics (Taiwan) Room 1603,16F International Trade Building No. 333, Section 1, Keelung Road Taipei, Taiwan, ROC

Phone: 886-2-87252000 Fax: 886-2-27576027

Japan Headquarters Mentor Graphics Japan Co., Ltd.

Gotenyama Hills 7-35, Kita-Shinagawa 4-chome Shinagawa-Ku, Tokyo 140 Japan

Phone:81-3-5488-3030

Fax: 81-3-5488-3021

12-2006 MGC

1025480-w

Calibre nmOPC - Mentor Graphics - #2

Design software, CAD software, Simulation software, Software, Tester