Sputter Etching System, Ion Gun and Control Electronics - LK Technologies - #1

► patented gas injection system avoids expensive differential pumping equipment

► noble gas sputtering at low chamber pressures (~10⁶)

► broad ion beam ensures uniform sputtering

► compatible with general sputter cleaning and ISS applications

► continuously tunable beam voltage to 3 kV

The LK Technologies Model NGI3000 Ion Gun with control electronics is designed for the cleaning of surfaces by ion sputtering with beam energies up to 3 keV and ion currents up to 25 uA. The gun employs a novel gas injection system which allows sputtering to take place at a typical chamber pressure of 1 x 10-6 Jorr. This reduction in gas load represents a major advantage over conventional ion guns which require chamber backfilling to nominally 5 x 10-5 Torr and, therefore, involve longer pumpdown times and potential gas impurity problems. The gas injection system allows the NGI3000 to be employed for ISS and other ion spectroscopic applications without the need for expensive differential pumping equipment. In the standard configuration a broad ion beam is presented to the sample, thereby ensuring uniform sputtering required in most sample cleaning operations.

The sputter etching system is typically furnished complete with the Model NGI3000 Ion Gun, Model NGI3000-SE control electronics and Model NGI3000-LV leak valve. Two standard gun lengths are available (see dimension drawing). The system is attractively priced and compatible with a range of typical sputter cleaning applications and ISS.

TECHNOLOGIES

Manufacturer of precision instrumentation for surface analysis including electron spectrometers, ion and electron guns, and LEED/Auger systems.