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| Microwave Diamond CVD Systems DiamaTek TOO Series fficnrpofWhc Ti jftahfrt Rfcsrmjartl Cavity Tfir+innlrvj^ 0*foflrv| Proven DtamcvTd Deposition Capability wlh High Erflcier^cy & Gontraf 1i''jj&m | |||||
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| Precise plasma control ■ Efficient energy coupling ' Flexible processing options ■ Provenl scale up performance - Uniform deposition & high rates ■ Fully Integrated systems ' Process development services ■ Clean room compatible | |||||
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| rared Systems for R&.D and Pro rj Lieti on | |||||
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| Pohtrystalline RhnB | |||||
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| - Computer controlled with aulo cycle profiling and integrated mlerowavf!. gas handling A vacuum modules - RertiolH position control of cavity tuning & substrate Power options, from 1 2 kW to 10 kW 2.45 GH: • Process parameters from 2D to 200 Torr ■ CompJole range of process gases | ik. i.ri-;: n.irni f tis | ||||
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| Single Crystal | |||||
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| | Lambda -i Technologies | Advanced Microwave Plasma Technologies | |||
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