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| Microwave Systems for Processing CVD Diamond | |||
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| DiamoTek 1200-EÇR | |||
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| The DianwTek i20D-EGR>5 a high density, low energy pfasrrw system, efecSrcw cydbfran resortsflce {£CR} system, The te&ctor tfesJgfrr Jncorporetes the patented'microwavk plasms disc with irttefrtat tuning snrf perniartertt, muftZ-poJavfCff magnefs, T/i/s r'nhefflnr opefadljtj HajfJiuWy and cord 0/ a prasrrra density and uniformity over a wide range of ti££rafrtg cSrt^JjflfTi and g£s$#j. A primary application forth* DiamoTek 1200-ECRis for eteilipgdiifmno'films for post presetting, jrtciutiir\g stress relief. | |||
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| System Features | |||
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| - 24 cm Plasma Dischar - High Density Plasma - Low ton Energy - Uniform Plasma Diffus | n sion | ||
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| - Confined ECR Magnetic Field - Con trowed Microwave Mode Operation - Broad Operating Ranga (1 ■ l&Tarr) - Magnetic Field Free Process Zone | |||
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| Advanced Microwave Plasma Technologies | |||
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