Catalogue - JEBG Series / Electron Beam Sources - Jeol - (Version JPG)

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Quadrupole mass spectrometer, XPS spectrometer, Plasma source, FE-SEM, Scanning probe microscope

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BS-60050EBS

Electron Beam Source with Reduced Backscattered Electrons

• Decreased backscattered electrons entering substrate (Absorption reduction}

• Accelerating voltage variable from outside

• Long life filament

• Contamination-resistant geometry

• Simple

-RTE


	I Specifications

	Maximum output Accelerating voltage range Electron beam deflection angle XY scan width XY position movement	10kW(1 Aat 10kV) -4kVIo-10kV 270° (permanent magnet and electromagnet) Max. <]>50mm (at -6kV) Max. J.50mm (at -6kV)
	Crucible Flow rate of cooling water	Not included 7.0 x 10^!lo 5.0 xlO^Pa 5 to 8 L/min. (water temperature: 10 to 25X), Pressure difference: 0.15 to 0.3 MPa
	External dimensions	177 (W) X2S4 (D) x 140 (H) mm
	Weight Corresponding power supply	App'oxin lately 14 kg JST-3F, JST-10F, JST-16F