JEBG Series / Electron Beam Sources - Jeol - #2

Since its foundation, JEOL, as an electron beam special­ist, has continued to clarify the characteristics of the elec­tron beam and placed special emphasis on its application research. As a result, JEOL has developed and commer­cialized a variety of electron beam sources and offered them to our customers.

All of our world-renowned electron microscopes, state-of-the-art electron beam lithography systems for production of VLSIs, and high-power electron beam sources for melting and purifying high-melting-point metal materials have also been developed and commercialized using the most advanced technology that JEOL has gained through many years of experience in the realm of its high-end technolo­gies. With such profound technical accomplishment in its background, JEOL now offers you electron beam sources and power supplies for electron beam evaporation. They are easy to operate, and provide enhanced stability and reliability. They are also successfully applied to the optical and electronic industries. In order to meet your diverse evaporation requirements, JEOL can provide you a wide variety of electron beam sources and optional devices, enabling them to be used in combination with your equip­ment.

BS-60050EBS

Electron Beam Source with Reduced Backscaftered Electrons..........

BS-60040VDGN

Accelerating Voltage Variable Electron Beam Source............

BS-60030DGN

Electron Beam Source............

JEBG-102UHO

Electron Beam Source............

EBG-102UB6S/4S

Electron Beam Sources

JEBG-203UAO

Electron Beam Source............

EBG-203UB4H/6S

Electron Beam Source

JEBG-163MB

Electron Beam Source............

JEBG-303UA

Electron Beam Source

High Voltage and Low Voltage Feedthroughs/Filaments/Grid Assemblies...................

JST-F series

Power Supplies.................

BS-64010SCT

Scan Controller.................

(DeviceNet operation unit, triple sourct controller, two point controller)

• Directly heats evaporation materials, thus high thi and enabling high-melting-point metals such as W, oxides to be evaporated.

• Uses a water-cooled copper crucible which, unlike ing, does not cause the evaporation materials to reac heater, thus allowing high-purity thin films to be produced

• Uses a tungsten filament as the electron-beam source, costs compared to resistance heating are very low.

• irradiating the evaporation material perpendicularly makes it possible to easily evaporate high-melting-point, low-ther­mal-conductivity oxides as well as metals that tend to sub­limate. In combination with high-speed scanning along the X and Y axes, JEOL electron beam sources assures you of a highly reproducible and uniform film thickness.

• You can select from a wide variety of crucibles to meet multiple-type and large-quantity evaporation.

• You can replace filaments very easily, and you need not adjust position.