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UVISEL Spectroscopic Ellipsometer

UVISEL Spectroscopic Ellipsometer
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High Precision Research Spectroscopic Ellipsometer The UVISEL ellipsometer offers the best combination of flexibility and performance for thin film characterization. Built on 25 years of experience, the UVISEL phase modulated ellipsometer delivers high precision and high resolution measurements, with the best signal to noise ratio, ideal for research on nano and micro scale structures. Film Thickness Optical Constants The UVISEL Ex-Situ is available in four different spectral ranges from FUV to NIR. A large array of options and accessories offers enhanced performance and versatility. Options & Accessories • • • • • • • • Motorized XY stage Rotation stage Temperature controlled stage Reflectometry module Electrochemical cell Liquid cell Sealed cell The use of monochromators enables the selection of the spectral range and resolution that best suits your measurement needs. Using the adaptation kit, it is possible to easily switch between in-situ and ex-situ configurations and experiment with new applications. UVISEL mounted on a CVD chamber UVISEL In-Line The UVISEL LT is a cost-effective configuration featuring a compact, integrated goniometer with no compromise on data quality. For the demanding needs of flexible electronic devices, flexible displays and flexible solar panels, the UVISEL In-Line is fully compatible with roll-to-roll processing. The setting of the goniometer angle can be selected to best fit with your applications. The stage can accommodate samples up to 200 mm in size, with substrate thickness up to 17 mm. The largest variety of data acquisition and modeling functions gives research engineers the full performance of ellipsometric analysis. A simple interface allows the operator to perform routine tasks very easily. Reflection and transmission ellipsometry Reflectance and transmittance intensity Kinetic ellipsometry Variable angle Depolarization Scatterometry Mueller matrix Modeling & Simulation The UVISEL In-Situ can be easily mounted onto process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for real-time control of thin film deposition or etching processes. It provides real-time calculation of film thickness and optical constants. We offer several UVISEL configurations capable of covering a wide spectral range from 190 - 2100 nm. The DeltaPsi 2 ellipsometry software presents an intuitive interface for instrument control, measurement and data processing. UVISEL In-Situ The UVISEL ellipsometer offers a flexible design, enabling the best fit to your application needs. • Manual or automatic goniometer, sample stage and microspot optics • Large variety of accessories • Ex-situ, in-situ and cost-effective configurations available The DeltaPsi2 software offers complete functionality for measurements, modeling and reporting, in addition to automatic operations, which facilitate routine thin film analysis. Automatic goniometer Wide Spectral Range Powerful Software Our ellipsometers are driven by the powerful and advanced DeltaPsi2 software, designed for accurate and flexible measurement and characterization of thin film structures. UVISEL Ex-Situ The UVISEL delivers long-term, stable measurements without the need for regular calibration. Powerful DeltaPsi2 Software from Research to Routine Material Properties The use of our patented multiwavelength detection system allows for a very fast acquisition time for superior thin film uniformity control of the moving substrate. The UVISEL Series is Based on Phase Modulation Technology. Specific features of this technology are: • No moving parts during signal acquisition • High modulation frequency (50 kHz) • Ψ (0-90) and ∆ (0-360) angles are measured over their entire range • Large materials library based on reference database and dispersion relations • Roughness or interface (EMA) • Alloy composition, crystallinity • Periodic structure • Graded optical constants • Anisotropic structures, uniaxial and biaxial films • Periodic structure • Nanoparticle modeling • Automatic backside correction for transparent substrates • Bandgap calculations • (n,k) fitting Integrated interface for measurement, analysis and reporting with drag and drop operations Customizable data reporting Data Reporting • Customized reporting • 2D/3D image display • Data import/export package Automatic Operations Recipes provide full automation of measurement, analysis, mapping (if selected) and reporting. The recipe contains all of the settings for the sample under analysis and is launched in one click. • Data reprocessing • Statistical analysis Recipe results with a 3D view of a sample map Measurements performed with a motorized XY stage

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The Power of Ellipsometry for Thin Films and Nanostructures Obtain thin film thickness and optical constants (n,k), as well as other properties of your thin film structure, including surface roughness, composition, and band gap. Find out more at www.horiba.com/ellipsometry Worldwide Training and Technical Support emiconductors Flat Panel Displays Optoelectronics Photovoltaics Optical and Functional Coatings Surface Chemistry and Biotechnology www.horiba.com/scientific info.sci@horiba.com Spectroscopic Phase Modulated Ellipsometer Our staff of experienced application and service engineers,...

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