Pulsed RF GD OES
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Catalog excerpts

Pulsed RF GD OES - 1

Pulsed RF Glow Discharge Optical Emission Spectrometry Ultra Fast Elemental Depth Profiling

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Pulsed RF GD OES - 2

Pulsed RF Glow Discharge Op tical Emission Spectrometry Quantitative Elemental Depth Profile Analysis from the first nanometer down to more than 150 microns 1-100 nm 10-1000 nm Protective coatings multilayered (thin films PV, LED, hard disks, electrodes for Li Native oxide (few nm) Corrosion protection Tribological improvement Structure: Multilayer, Gradient, Elemental composition Interface details Layer intermixing Compound formation Most materials today are either Adhesion improvement Element inter-diffusion Substrate protection Speed & depth resolution With a typical erosion rate of...

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Pulsed RF GD OES - 3

A multidimensional platform for material analysis Electrodes of Li ion batteries are readily measured with the Pulsed RF GD-OES. Strategies for sample handling (including the Li bell for air sensitive materials) have been developed. The patented UFS assures that the sputtering is equally fast on positive and negative electrodes. Ref: HORIBA Scientific Application note n°18 Deposition process control Pulsed RF GD-OES data allow following N and C profiles in depth, together with all other elements to control nitruration processes and are correlated to hardness testings. Pulsed RF GD-OES is...

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Pulsed RF GD OES - 4

Why the source makes the difference Source principle The source is central to the operation of the instrument and accounts for many of its specific characteristics. Unique source design The design of the HORIBA Scientific source has unique features that are essential for the advanced performance of the instruments. T he two mechanisms of sputtering and excitation are spatially separated. The sputtering is material dependent, but the emission taking place in the gas phase is nearly independent from the material. This absence of matrix effects is a clear advantage over Secondary Ion Mass...

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Pulsed RF GD OES - 5

Why light matters Flexibility: the true n+1 detection A confined plasma source Even with the most complete line array, there could always be a need to measure an n+1 element for new research, to trace nano-particles added within a layer, to evaluate the impact of the addition of a minor element in the absorber layer of a PV cell on the efficiency of this cell, or to look at a new film deposit. The GD plasma is confined within the anode tube. 4 mm is the optimum anode diameter. Smaller anodes are available but they reduce the amount of light, and side walls effects become non-negligible....

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Pulsed RF GD OES - 6

A multidimensional platform f or material analysis Software Multitasking and multilingual, Quantum software offers easy access to all the functionalities of the instrument (control of poly and mono operation, management of the patented PolyscanTM pulsed operation, etc.). Quantum can be used for data treatment on other computers in emulation mode while the instrument is making measurements. V 22 Overlay of measurements to study a varying process Powerful and flexible data handling with the unique functionalities of Time Plus (to increase analysis time during measurement), UFS (Ultra Fast...

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Pulsed RF GD OES - 7

Look at the Surface and Beyond... 4 GD Labs at your service Paris - New York - Tokyo - Shanghaï HORIBA Scientific's New R&D centre in Paris Saclay with the world's largest scientific gratings facility We know GD and its multiple application possibilities! The International GD Day, held every 2 years, gathers practitioners and researchers interested in all aspects of analytical GD for surface and depth profile analysis of materials. Presentations made by the users cover a wide variety of application topics. The GD Day also gives attendees the opportunity to see the latest instrument...

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